Anomalous positive microwave magnetoresistance of compensated Ge:Ga near the metal-insulator transition

被引:0
|
作者
Veinger, AI [1 ]
Zabrodskii, AG [1 ]
Tisnek, TV [1 ]
机构
[1] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 2002年 / 230卷 / 01期
关键词
D O I
10.1002/1521-3951(200203)230:1<107::AID-PSSB107>3.0.CO;2-7
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The contactless technique of electron spin resonance was used to measure magnetoresistance (MR) phenomena in heavily doped and compensated Ge:Ga both in the insulator and metallic phases near the insulator-metal (IM) transition. The concentration dependency of the temperature power coefficient of the MR allows us to identify the effect origin versus the hole density. They are: the wave function shrinkage by magnetic field at p < 8.7 x 10(16) cm(-3); the weak localization regime of the quantum correction theory with the temperature depending diffusion coefficient at 8.7 x 10(16) < p < 1.5 x 10(17) cm(-3); and the same theory with the temperature independent diffusion coefficient at p > 1.5 x 10(17) cm(-3).
引用
收藏
页码:107 / 111
页数:5
相关论文
共 50 条
  • [31] THERMOELECTRIC-POWER OF N-TYPE GE NEAR A METAL-INSULATOR TRANSITION
    LONCHAKOV, AT
    TSIDILKOVSKII, IM
    MATVEEV, GA
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1988, 22 (05): : 529 - 532
  • [32] THE LOW-TEMPERATURE MAGNETORESISTANCE OF ARSENIC-DOPED SILICON NEAR THE METAL-INSULATOR TRANSITION
    SHAFARMAN, WN
    CASTNER, TG
    BROOKS, JS
    MARTIN, KP
    NAUGHTON, MJ
    SOLID-STATE ELECTRONICS, 1985, 28 (1-2) : 93 - 99
  • [33] Magnetoresistance in the region of the possible metal-insulator transition in icosahedral AlPdRe
    Rodmar, M
    Oberschmidt, D
    Ahlgren, M
    Gignoux, C
    Berger, C
    Rapp, Ö
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 250 : 888 - 892
  • [34] Features of the conductivity and magnetoresistance of doped two-dimensional structures near a metal-insulator transition
    N. V. Agrinskaya
    V. I. Kozub
    JETP Letters, 2013, 98 : 304 - 311
  • [35] LOW TEMPERATURE MAGNETORESISTANCE OF ARSENIC-DOPED SILICON NEAR THE METAL-INSULATOR TRANSITION.
    Shafarman, W.N.
    Castner, T.G.
    Brooks, J.S.
    Martin, K.P.
    Naughton, M.J.
    Solid-State Electronics, 1984, 28 (1-2) : 93 - 99
  • [36] Features of the conductivity and magnetoresistance of doped two-dimensional structures near a metal-insulator transition
    Agrinskaya, N. V.
    Kozub, V. I.
    JETP LETTERS, 2013, 98 (05) : 304 - 311
  • [37] Magnetoresistance and Hall effect in amorphous silicon-tantalum alloys near the metal-insulator transition
    Wright, T
    Popescu, B
    Adkins, CJ
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 : 548 - 553
  • [38] Magnetoresistance and Hall effect in amorphous silicon-tantalum alloys near the metal-insulator transition
    Wright, T.
    Popescu, Benedict
    Adkins, C.J.
    Journal of Non-Crystalline Solids, 227-230 (Pt A): : 548 - 553
  • [39] Magnetoresistance in the region of the possible metal-insulator transition in icosahedral AlPdRe
    Rodmar, M.
    Oberschmidt, D.
    Ahlgren, M.
    Gignoux, C.
    Berger, C.
    Rapp, O.
    Journal of Non-Crystalline Solids, 1999, 250
  • [40] Magnetoresistance anomaly during the electrical triggering of a metal-insulator transition
    Salev, Pavel
    Fratino, Lorenzo
    Sasaki, Dayne
    Bag, Soumen
    Takamura, Yayoi
    Rozenberg, Marcelo
    Schuller, Ivan K.
    PHYSICAL REVIEW B, 2023, 108 (17)