Development of critical dimension measurement scanning electron microscope for ULSI(S-8000series)

被引：4
|
作者：
Ezumi, M [1 ]
Otaka, T [1 ]
Mori, H [1 ]
Todokoro, H [1 ]
机构：
[1] HITACHI LTD,INSTRUMENT DIV,HITACHINAKA,IBARAKI 312,JAPAN
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X | 1996年 / 2725卷
关键词：
critical dimension measurement scanning electron microscope; schottky emission; retarding; ExB deflection;
D O I：
10.1117/12.240146
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：105 / 113
页数：9
相关论文
共 50 条
  • [21] Measurement of the parameters of the electron beam of a scanning electron microscope
    Gavrilenko, V. P.
    Novikov, Yu. A.
    Rakov, A. V.
    Todua, P. A.
    INSTRUMENTATION, METROLOGY, AND STANDARDS FOR NANOMANUFACTURING II, 2008, 7042
  • [22] Evaluation of total uncertainty in the dimension measurements using critical-dimension measurement scanning electron microscopes
    Mizuno, F
    Shimizu, M
    Sasada, K
    Mizuno, T
    Yamada, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3661 - 3667
  • [23] THE DEVELOPMENT OF THE SCANNING ELECTRON-MICROSCOPE
    OATLEY, CW
    MCMULLAN, D
    SMITH, KCA
    ADVANCES IN IMAGING AND ELECTRON PHYSICS, 1985, : 443 - 482
  • [24] MEASUREMENT OF FIBRE POTENTIALS IN A SCANNING ELECTRON MICROSCOPE
    WEITZENK.LA
    JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1969, 2 (07): : 561 - &
  • [25] VOLTAGE MEASUREMENT IN THE SCANNING ELECTRON-MICROSCOPE
    GOPINATH, A
    ADVANCES IN ELECTRONICS AND ELECTRON PHYSICS, 1987, 69 : 1 - 53
  • [26] Critical-dimension measurement using multi-angle-scanning method in atomic force microscope
    Murayama, Ken
    Gonda, Satoshi
    Koyanagi, Hajime
    Terasawa, Tsuneo
    Hosaka, Sumio
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (07): : 5928 - 5932
  • [27] Critical-dimension measurement using multi-angle-scanning method in atomic force microscope
    Murayama, Ken
    Gonda, Satoshi
    Koyanagi, Hajime
    Terasawa, Tsuneo
    Hosaka, Sumio
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (07): : 5928 - 5932
  • [28] THE ACCURACY OF LINEAR DIMENSION MEASUREMENTS IN SCANNING ELECTRON-MICROSCOPE
    KOZLITIN, AI
    NIKITIN, AV
    IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA, 1993, 57 (09): : 17 - 24
  • [29] Simulation study of repeatability and bias in the critical dimension scanning electron microscope -: art. no. 033002
    Villarrubia, JS
    Vladár, AE
    Postek, MT
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2005, 4 (03):
  • [30] Measurement of the divergence angle of the electron microprobe of a scanning electron microscope
    Novikov, YA
    Rakov, AV
    Stekolin, IY
    MEASUREMENT TECHNIQUES, 1996, 39 (12) : 1204 - 1206
12345