Negative donors in bulk Si and Si/SiO2 quantum wells in a magnetic field

被引:3
|
作者
Inoue, Jun-ichi [1 ]
Chiba, Tomo [1 ]
Natori, Akiko [1 ]
Nakamura, Jun [1 ,2 ]
机构
[1] Univ Electrocommun, Dept Elect Engn, Tokyo 1828585, Japan
[2] Univ Tokyo, Inst Solid State Phys, Chiba 2778581, Japan
关键词
binding energy; electron traps; elemental semiconductors; ground states; Monte Carlo methods; semiconductor quantum wells; silicon; silicon compounds; spin-orbit interactions; D-CENTERS; UNIAXIAL-STRESS; STATES; SILICON; SEMICONDUCTORS; ENERGIES; ATOMS; ION;
D O I
10.1103/PhysRevB.79.035206
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The spin-singlet ground states of a D- ion in bulk Si and Si/SiO2 quantum wells have been investigated in the presence of a magnetic field, using a diffusion quantum Monte Carlo method. By neglecting the central-cell correction, the negative donor state can be assigned by the valley indexes of two trapped electrons. In the bulk Si, the ground-state energies of negative donors of both the intervalley and intravalley configurations split into two levels in a magnetic field along the z axis and the lowest-energy state becomes the intervalley configuration of the two electrons in the valleys with their longitudinal axes perpendicular to the magnetic field. The magnetic field increases the binding energy of a negative donor and the strongest enhancement is attained for the intravalley configuration of the two electrons in the valley with the longitudinal axis parallel to the magnetic field. In the quantum well with the interface within the x-y plane, the quantum confinement effect changes the lowest-energy state of a negative donor from the intervalley configuration in the bulk to the intravalley configuration for which the binding energy is increased most strongly by the magnetic field perpendicular to the well interface. The central-cell correction on the binding energy of a D- ion in a quantum well is also discussed.
引用
收藏
页数:8
相关论文
共 50 条
  • [1] Crystalline Si/SiO2 quantum wells
    Lu, ZH
    Grozea, D
    APPLIED PHYSICS LETTERS, 2002, 80 (02) : 255 - 257
  • [2] Photoluminescence spectrum of a-Si/SiO2 and c-Si/SiO2 quantum wells
    Kanemitsu, Y
    Iiboshi, M
    Kushida, T
    JOURNAL OF LUMINESCENCE, 2000, 87-9 : 463 - 465
  • [3] Role of defects in Si/SiO2 quantum wells
    Degoli, E
    Ossicini, S
    OPTICAL MATERIALS, 2001, 17 (1-2) : 95 - 98
  • [4] Laser annealing of the Si layers in Si/SiO2 multiple quantum wells
    Arguirov, T.
    Mchedlidze, T.
    Kouteva-Arguirova, S.
    Kittler, M.
    Roelver, R.
    Berghoff, B.
    Baetzner, D.
    Spangenberg, B.
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2009, 159-60 : 57 - 60
  • [5] Strong interface effects in graded SiO2/Si/SiO2 quantum wells
    de Sousa, JS
    Farias, GA
    Freire, VN
    da Silva, EF
    JOURNAL OF APPLIED PHYSICS, 1998, 84 (09) : 5369 - 5371
  • [6] Optical transitions from SiO2/crystalline Si/SiO2 quantum wells
    Cho, EC
    Reece, P
    Green, MA
    Corkish, R
    Gal, M
    COMMAD 2002 PROCEEDINGS, 2002, : 271 - 274
  • [7] Photoluminescence dynamics of amorphous Si/SiO2 quantum wells
    Kanemitsu, Y
    Iiboshi, M
    Kushida, T
    APPLIED PHYSICS LETTERS, 2000, 76 (16) : 2200 - 2202
  • [8] Antireflection and surface passivation behaviour of SiO2/Si/SiO2 quantum wells on silicon
    Cho, EC
    Xia, J
    Aberle, AG
    Green, MA
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2002, 74 (1-4) : 147 - 154
  • [9] Optical Properties of Amorphous and Nanostructure Si/SiO2 Quantum Wells
    Takeuchi, Toshio
    Kondo, Minoru
    Fujuta, Miki
    Kawaharazuka, Atsushi
    Horikoshi, Yoshiji
    JOURNAL OF NANO RESEARCH, 2014, 26 : 59 - 62
  • [10] Effect of laser annealing on crystallinity of the Si layers in Si/SiO2 multiple quantum wells
    Arguirov, T.
    Mchedlidze, T.
    Akhmetov, V. D.
    Arguirova, S. Kouteva
    Kittler, M.
    Roelver, R.
    Berghoff, B.
    Foerst, M.
    Baetzner, D. L.
    Spangenberg, B.
    APPLIED SURFACE SCIENCE, 2007, 254 (04) : 1083 - 1086