Numerical Modeling of Drying Thin Film Coating with a Surface-Wiping Process

被引：2
|
作者：
Yamamura, Masato [1 ]
Mawatari, Yoshihide [1 ]
Kage, Hiroyuki [1 ]
机构：
[1] Kyushu Inst Technol, Dept Appl Chem, Kitakyushu, Fukuoka 8048550, Japan
来源：
KAGAKU KOGAKU RONBUNSHU | 2009年 / 35卷 / 05期
关键词：
Thin Film Coating; Drying; Modeling; Wiping; Boiling; COATED POLYMER-FILMS; MEMBRANE FORMATION; MULTICOMPONENT DIFFUSION; CAST PROCESS; OPTIMIZATION; DRYER;
D O I：
10.1252/kakoronbunshu.35.436
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
The drying of thin film coating with a surface-wiping process was modeled numerically. A one-dimensional diffusion equation for a PVAc-toluene system was solved by taking into account temperature/concentration-dependent diffusion coefficients and solvent vapor pressures to obtain solvent concentration profiles. The numerical results revealed a peak in the concentration profile at a particular thickness in the wiping process due to diffusion of solvent from the wiping layer to the coating. The resultant increase in residual solvent contents gives rise to a significant drop in solution boiling point, leading to the occurrence of boiling periods during drying.
引用
收藏
页码：436 / 441
页数：6
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