Numerical Modeling of Drying Thin Film Coating with a Surface-Wiping Process

被引：2

作者：

Yamamura, Masato ^{[1
]}

Mawatari, Yoshihide ^{[1
]}

Kage, Hiroyuki ^{[1
]}

机构：

[1] Kyushu Inst Technol, Dept Appl Chem, Kitakyushu, Fukuoka 8048550, Japan

来源：

KAGAKU KOGAKU RONBUNSHU | 2009年 / 35卷 / 05期

关键词：

Thin Film Coating; Drying; Modeling; Wiping; Boiling; COATED POLYMER-FILMS; MEMBRANE FORMATION; MULTICOMPONENT DIFFUSION; CAST PROCESS; OPTIMIZATION; DRYER;

D O I：

10.1252/kakoronbunshu.35.436

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The drying of thin film coating with a surface-wiping process was modeled numerically. A one-dimensional diffusion equation for a PVAc-toluene system was solved by taking into account temperature/concentration-dependent diffusion coefficients and solvent vapor pressures to obtain solvent concentration profiles. The numerical results revealed a peak in the concentration profile at a particular thickness in the wiping process due to diffusion of solvent from the wiping layer to the coating. The resultant increase in residual solvent contents gives rise to a significant drop in solution boiling point, leading to the occurrence of boiling periods during drying.

引用

页码：436 / 441

页数：6

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