Surface Topography and Optical Properties of Thin AlN Films Produced on GaAs (100) Substrate by Reactive Ion-Plasma Sputtering

被引：2
|
作者：
Fomin, E. V. [1 ,2 ]
Bondarev, A. D. [2 ]
Rumyantseva, A. I. [3 ]
Maurer, T. [3 ]
Pikhtin, N. A. [2 ]
Tarasov, S. A. [1 ]
机构：
[1] St Petersburg State Electrotech Univ LETI, St Petersburg 197022, Russia
[2] Russian Acad Sci, Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[3] Univ Technol Troyes, CNRS, UMR 6281, Lab Nanotechnol & Instrumentat Opt,ICD, Troyes, France
来源：
TECHNICAL PHYSICS LETTERS | 2019年 / 45卷 / 03期
关键词：
PASSIVATION; FACETS; ZNSE;
D O I：
10.1134/S1063785019030076
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A study of the surface topography and optical characteristics of thin AlN films used as passivating and antireflection coatings deposited on n-GaAs (100) substrates by reactive ion-plasma sputtering is reported. It was found that the process conditions affect the structure and the optical characteristics of the films, which makes it possible to obtain coatings with prescribed parameters. An analysis of the results furnished by ellipsometry and atomic-force microscopy of the surface shows that the refractive index of the films is correlated with the surface structure.
引用
收藏
页码：221 / 224
页数：4
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