Realization of preferential (100) oriented AlN thin films on Mo coated Si substrate using reactive RF magnetron sputtering

被引：0
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作者：
Das, Amal [1 ]
Rath, Martando [2 ]
Nair, Deleep R. [1 ]
Ramachandra Rao, M.S. [2 ]
DasGupta, Amitava [1 ]
机构：
[1] Department of Electrical Engineering, Microelectronics and MEMS Laboratory, IIT Madras, Chennai,600036, India
[2] Department of Physics, Nano Functional Materials Technology Centre and Material Science Research Centre, Indian Institute of Technology Madras, Chennai,600036, India
来源：
Applied Surface Science | 2021年 / 550卷
关键词：
The authors would like to thank Centre for NEMS and Nanophotonics (CNNP); Indian Institute of Technology Madras for providing the fabrication and characterization facilities and Ministry of Information Technology (MeitY); Government of India for their support. MSR would like to thank the financial support of DST; New Delhi (Grant # DST/NM/JIIT-01/2016(C));
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摘要：
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