Measurement of Magnetic Field Distorting the Electron Beam Direction in Scanning Electron Microscope

被引:4
|
作者
Pluska, Mariusz [1 ,2 ]
Oskwarek, Lukasz [1 ]
Rak, Remigiusz J. [1 ]
Czerwinski, Andrzej [2 ]
机构
[1] Warsaw Univ Technol, Inst Theory Elect Engn Measurement & Informat Sys, PL-00661 Warsaw, Poland
[2] Inst Electr Mat Technol, PL-02668 Warsaw, Poland
关键词
Distortion; electromagnetic interference (EMI); electron beam deflection; electron microscopy; magnetic field measurement; magnetic fields;
D O I
10.1109/TIM.2008.928415
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The magnetic field that is generated by different electric devices in an environment of a scanning electron microscope (SEM) causes the direction of the electron beam to become distorted and, consequently, registered images to become distorted. This paper describes a method for a measurement of the magnetic field affecting the direction of the electron beam. It consists of the analysis of SEM images that are registered for several distances between the final aperture of an electron column and a specimen. Means of the measurement of a constant and a periodic magnetic held are explained. The presented examples show the results of the measurement of the constant field that is generated by coils that are placed either inside of outside the microscope chassis. The results are compared with the ones obtained using a reference magnetometer. In the presented method, a direct magnetic field influence on the electron beam is separated from any other influences. Also, the magnetic field nonuniformity along the electron beam path is considered. The current investigations enable the magnetic field compensation and test the shielding efficiency of the SEM chassis.
引用
收藏
页码:173 / 179
页数:7
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