Isokinetic analysis of nanocrystalline nickel electrodeposits upon annealing

被引:148
|
作者
Wang, N
Wang, ZR
Aust, KT
Erb, U
机构
[1] UNIV TORONTO, DEPT MET & MAT SCI, TORONTO, ON M5S 3E4, CANADA
[2] QUEENS UNIV, DEPT MAT & MET ENGN, KINGSTON, ON K7L 3N6, CANADA
关键词
D O I
10.1016/S1359-6454(96)00254-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The grain growth kinetics of nanocrystalline nickel electrodeposits was studied by transmission electron microscopy and differential scanning calorimetry at different heating rates. It was found that, upon annealing, the nanocrystals in the nickel electrodeposits appeared to grow abnormally and released about 415.7 +/- 3.5 J/mol of heat. The mechanism of the abnormal grain growth was attributed to the subgrain coalescence. The method for determination of the grain growth activation energy as well as all the other kinetic parameters in the Johnson-Mehl-Avrami equation was proposed based on an isokinetic analysis. This method is applicable to general types of transformation process governed by a single activation energy under the isokinetic condition. The activation energy for the grain growth of nanocrystalline nickel electrodeposits was found to be about 131.5 kJ/mol using this method. The difference between the present method and the Kissinger and Ozawa method was addressed in terms of their physical backgrounds. (C) 1997 Acta Metallurgica Inc.
引用
收藏
页码:1655 / 1669
页数:15
相关论文
共 50 条
  • [31] Effect of Annealing on Hardness and the Modulus of Elasticity in Bulk Nanocrystalline Nickel
    Torrents, Anna
    Yang, Heather
    Mohamed, Farghalli A.
    METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 2010, 41A (03): : 621 - 630
  • [32] DEFECT STRUCTURE IN NICKEL ELECTRODEPOSITS
    NAKAHARA, S
    FELDER, EC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (01) : 45 - 49
  • [33] On texture formation of nickel electrodeposits
    Nielsen, CB
    Horsewell, A
    Ostergard, MJL
    JOURNAL OF APPLIED ELECTROCHEMISTRY, 1997, 27 (07) : 839 - 845
  • [34] GROWTH OF NICKEL EPITAXIAL ELECTRODEPOSITS
    FRAISE, P
    FROMENT, M
    LAUPRETR.JM
    MAURIN, G
    JOURNAL DE MICROSCOPIE, 1973, 17 (01): : 1 - +
  • [35] DEFECT STRUCTURE IN NICKEL ELECTRODEPOSITS
    NAKAHARA, S
    FELDER, EC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C380 - C380
  • [36] On texture formation of nickel electrodeposits
    C. BERGENSTOF NIELSEN
    A. HORSEWELL
    M. J. L. ØSTERGÀRD
    Journal of Applied Electrochemistry, 1997, 27 : 839 - 845
  • [37] INTERNAL STRESSES IN NICKEL ELECTRODEPOSITS
    BIRYUKOV, ND
    SILETSKA.KA
    RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY,USSR, 1970, 44 (09): : 1310 - &
  • [38] MORPHOLOGY AND PERMEABILITY OF NICKEL ELECTRODEPOSITS
    PAATSCH, W
    PLATING AND SURFACE FINISHING, 1988, 75 (08): : 52 - 55
  • [39] On texture formation of nickel electrodeposits
    Nielsen, C.Bergenstof
    Horsewell, A.
    Ostergard, M.J.L.
    1997, Chapman & Hall Ltd, London, United Kingdom (27)
  • [40] IMPORTANCE OF THE TEXTURE INDEX FOR NICKEL ELECTRODEPOSITS
    SCHILS, HW
    ATANASSOV, N
    TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 1995, 73 : 37 - 40