Isokinetic analysis of nanocrystalline nickel electrodeposits upon annealing

被引：148
|
作者：
Wang, N
Wang, ZR
Aust, KT
Erb, U
机构：
[1] UNIV TORONTO, DEPT MET & MAT SCI, TORONTO, ON M5S 3E4, CANADA
[2] QUEENS UNIV, DEPT MAT & MET ENGN, KINGSTON, ON K7L 3N6, CANADA
来源：
ACTA MATERIALIA | 1997年 / 45卷 / 04期
关键词：
D O I：
10.1016/S1359-6454(96)00254-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The grain growth kinetics of nanocrystalline nickel electrodeposits was studied by transmission electron microscopy and differential scanning calorimetry at different heating rates. It was found that, upon annealing, the nanocrystals in the nickel electrodeposits appeared to grow abnormally and released about 415.7 +/- 3.5 J/mol of heat. The mechanism of the abnormal grain growth was attributed to the subgrain coalescence. The method for determination of the grain growth activation energy as well as all the other kinetic parameters in the Johnson-Mehl-Avrami equation was proposed based on an isokinetic analysis. This method is applicable to general types of transformation process governed by a single activation energy under the isokinetic condition. The activation energy for the grain growth of nanocrystalline nickel electrodeposits was found to be about 131.5 kJ/mol using this method. The difference between the present method and the Kissinger and Ozawa method was addressed in terms of their physical backgrounds. (C) 1997 Acta Metallurgica Inc.
引用
收藏
页码：1655 / 1669
页数：15
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