High-efficiency blazed diffractive optical elements for the violet wavelength fabricated by electron-beam lithography

被引:46
|
作者
Shiono, T [1 ]
Hamamoto, T
Takahara, K
机构
[1] Matsushita Elect Ind Co Ltd, Storage Media Syst Dev Ctr, Moriguchi, Osaka 5708501, Japan
[2] Osaka Sci & Technol Ctr, Factory Adv Opt Technol, Osaka 5941157, Japan
关键词
D O I
10.1364/AO.41.002390
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Blazed diffractive optical elements (DOEs) were studied for the violet wavelength by electron-beam lithography. By optimizing electron-beam writing parameters and electron-dose distributions, we fabricated eight kinds of grating (period Lambda = 10-0.54 mum) with excellent blazed structure. It has been demonstrated that the measured diffraction efficiency values agreed well with the rigorous theoretical ones. For the fine period of 0.54 mum, we confirmed a peak appearance of 75.6% (TE) experimentally. A wave aberration as small as similar to0.01lambda (rms) was obtained for the first-order diffracted wave from the fabricated DOEs. Blazed DOEs for the violet wavelength could be used as key devices in a high-density optical disk pickup of the next generation. (C) 2002 Optical Society of America.
引用
收藏
页码:2390 / 2393
页数:4
相关论文
共 50 条
  • [31] Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
    Steingrüber, R
    Ferstl, M
    Pilz, W
    MICROELECTRONIC ENGINEERING, 2001, 57-8 : 285 - 289
  • [32] Electron-beam lithography for thick refractive optical elements in SU-8
    Shields, EA
    Williamson, F
    Leger, JR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (04): : 1453 - 1458
  • [33] Fabrication of semi-continuous profile diffractive optical elements for beam shaping by electron beam lithography
    Nottola, A
    Gerardino, A
    Gentili, M
    Di Fabrizio, E
    Cabrini, S
    Melpignano, P
    Rotaris, G
    MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) : 325 - 328
  • [34] Optical properties of thick metal nanohole arrays fabricated by electron-beam and nanosphere lithography
    Hajiaboli, Ahmad Reza
    Cui, Bo
    Kahrizi, M.
    Truong, Vo-Van
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (05): : 976 - 979
  • [35] MTF EVALUATION FOR OPTICAL AND ELECTRON-BEAM LITHOGRAPHY
    NAKASE, M
    MATSUMOTO, Y
    PHOTOGRAPHIC SCIENCE AND ENGINEERING, 1979, 23 (04): : 215 - 218
  • [36] Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials
    Wang, Yuanyuan
    Pan, Jia-Ahn
    Wu, Haoqi
    Talapin, Dmitri V.
    ACS NANO, 2019, 13 (12) : 13917 - 13931
  • [37] NEW TECHNIQUES ALTERNATIVE TO OPTICAL LITHOGRAPHY - ELECTRON-BEAM LITHOGRAPHY
    TAKIGAWA, T
    DENKI KAGAKU, 1987, 55 (05): : 358 - 362
  • [38] Diffractive optical elements obtained using electron-beam writer and reactive ion etching
    Kowalik, A
    Jaroszewicz, Z
    Góra, K
    OPTICAL TECHNIQUES FOR ENVIRONMENTAL SENSING, WORKPLACE SAFETY, AND HEALTH MONITORING, 2002, 4887 : 141 - 147
  • [39] Titanium single-electron transistor fabricated by electron-beam lithography
    Sillanpää, MA
    Hakonen, PJ
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2002, 15 (01): : 41 - 47
  • [40] MICRO FRESNEL LENSES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY.
    Fujita, Teruo
    Nishihara, Hiroshi
    Koyama, Jiro
    1600, (64):