Damage-free cathode coating process for OLEDs

被引：5
|
作者：
Prakash, Shiva [1 ]
机构：
[1] DuPont Displays, Santa Barbara, CA 93117 USA
来源：
2008 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXIX, BOOKS I-III | 2008年 / 39卷
关键词：
LIGHT-EMITTING-DIODES; DEVICES;
D O I：
10.1889/1.3069605
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
OLED displays require the growth of inorganic films over organic films. The inorganic film sometimes manifests as cathode metal (bottom-emission displays), or as the optical enhancement layer (OEL, in top emission displays). Sputtering is the first process of choice in both cases due to simplicity, low cost and scalability. However, plasma damage to the organic underlayers prevents sputtering from being routinely used. A closed-drift ion beam sputtering process was found effective in growing inorganic films with negligible damage to the organic underlayers.
引用
收藏
页码：2046 / 2048
页数：3
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