共 50 条
Point defect creation by proton and carbon irradiation of α-Ga2O3
被引:13
|作者:
Polyakov, Alexander Y.
[1
]
Nikolaev, Vladimir, I
[2
,3
]
Meshkov, Igor N.
[4
]
Siemek, Krzysztof
[4
,10
]
Lagov, Petr B.
[1
,5
]
Yakimov, Eugene B.
[1
,6
]
Pechnikov, Alexei, I
[2
,3
]
Orlov, Oleg S.
[4
]
Sidorin, Alexey A.
[4
]
Stepanov, Sergey, I
[2
,3
]
Shchemerov, Ivan, V
[1
]
Vasilev, Anton A.
[1
]
Chernykh, Alexey, V
[1
]
Losev, Anton A.
[7
]
Miliachenko, Alexandr D.
[7
]
Khrisanov, Igor A.
[7
]
Pavlov, Yu S.
[5
]
Kobets, U. A.
[8
]
Pearton, Stephen J.
[9
]
机构:
[1] Natl Univ Sci & Technol MISiS, Leninsky Pr 4, Moscow 119049, Russia
[2] Ioffe Inst, 26 Polytekhnicheskaya Str, St Petersburg 194021, Russia
[3] Perfect Crystals LLC, 28 Politekhnicheskaya Str, St Petersburg 194064, Russia
[4] Joint Inst Nucl Res, Joliot Curie 6, Moscow 141980, Russia
[5] Russian Acad Sci IPCE RAS, Lab Radiat Technol, AN Frumkin Inst Phys Chem & Electrochem, Moscow 119071, Russia
[6] Russian Acad Sci, Inst Microelect Technol & High Pur Mat, 6 Academician Ossipyan Str, Chernogolovka 142432, Moscow Region, Russia
[7] NRC, Kurchatov Inst, Inst Theoret & Expt Phys, B Cheremushkinskaya 25, Moscow 117218, Russia
[8] Inst Phys & Power Engn, Bondarenko Sq 1, Obninsk 249033, Russia
[9] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[10] Polish Acad Sci, Inst Nucl Phys, PL-31342 Krakow, Poland
基金:
美国国家科学基金会;
关键词:
SPECTROSCOPY;
D O I:
10.1063/5.0100359
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Films of alpha-Ga2O3 grown by Halide Vapor Phase Epitaxy (HVPE) were irradiated with protons at energies of 330, 400, and 460 keV with fluences 6 x 10(15) cm(-2) and with 7 MeV C4+ ions with a fluence of 1.3 x 10(13) cm(-2) and characterized by a suite of measurements, including Photoinduced Transient Current Spectroscopy (PICTS), Thermally Stimulated Current (TSC), Microcathodoluminescence (MCL), Capacitance-frequency (C-f), photocapacitance and Admittance Spectroscopy (AS), as well as by Positron Annihilation Spectroscopy (PAS). Proton irradiation creates a conducting layer near the peak of the ion distribution and vacancy defects distribution and introduces deep traps at E-c-0.25, 0.8, and 1.4 eV associated with Ga interstitials, gallium-oxygen divacancies V-Ga-V-O, and oxygen vacancies V-O. Similar defects were observed in C implanted samples. The PAS results can also be interpreted by assuming that the observed changes are due to the introduction of V-Ga and V-Ga-V-O.
引用
收藏
页数:9
相关论文