Point defect creation by proton and carbon irradiation of α-Ga2O3

被引:13
|
作者
Polyakov, Alexander Y. [1 ]
Nikolaev, Vladimir, I [2 ,3 ]
Meshkov, Igor N. [4 ]
Siemek, Krzysztof [4 ,10 ]
Lagov, Petr B. [1 ,5 ]
Yakimov, Eugene B. [1 ,6 ]
Pechnikov, Alexei, I [2 ,3 ]
Orlov, Oleg S. [4 ]
Sidorin, Alexey A. [4 ]
Stepanov, Sergey, I [2 ,3 ]
Shchemerov, Ivan, V [1 ]
Vasilev, Anton A. [1 ]
Chernykh, Alexey, V [1 ]
Losev, Anton A. [7 ]
Miliachenko, Alexandr D. [7 ]
Khrisanov, Igor A. [7 ]
Pavlov, Yu S. [5 ]
Kobets, U. A. [8 ]
Pearton, Stephen J. [9 ]
机构
[1] Natl Univ Sci & Technol MISiS, Leninsky Pr 4, Moscow 119049, Russia
[2] Ioffe Inst, 26 Polytekhnicheskaya Str, St Petersburg 194021, Russia
[3] Perfect Crystals LLC, 28 Politekhnicheskaya Str, St Petersburg 194064, Russia
[4] Joint Inst Nucl Res, Joliot Curie 6, Moscow 141980, Russia
[5] Russian Acad Sci IPCE RAS, Lab Radiat Technol, AN Frumkin Inst Phys Chem & Electrochem, Moscow 119071, Russia
[6] Russian Acad Sci, Inst Microelect Technol & High Pur Mat, 6 Academician Ossipyan Str, Chernogolovka 142432, Moscow Region, Russia
[7] NRC, Kurchatov Inst, Inst Theoret & Expt Phys, B Cheremushkinskaya 25, Moscow 117218, Russia
[8] Inst Phys & Power Engn, Bondarenko Sq 1, Obninsk 249033, Russia
[9] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[10] Polish Acad Sci, Inst Nucl Phys, PL-31342 Krakow, Poland
基金
美国国家科学基金会;
关键词
SPECTROSCOPY;
D O I
10.1063/5.0100359
中图分类号
O59 [应用物理学];
学科分类号
摘要
Films of alpha-Ga2O3 grown by Halide Vapor Phase Epitaxy (HVPE) were irradiated with protons at energies of 330, 400, and 460 keV with fluences 6 x 10(15) cm(-2) and with 7 MeV C4+ ions with a fluence of 1.3 x 10(13) cm(-2) and characterized by a suite of measurements, including Photoinduced Transient Current Spectroscopy (PICTS), Thermally Stimulated Current (TSC), Microcathodoluminescence (MCL), Capacitance-frequency (C-f), photocapacitance and Admittance Spectroscopy (AS), as well as by Positron Annihilation Spectroscopy (PAS). Proton irradiation creates a conducting layer near the peak of the ion distribution and vacancy defects distribution and introduces deep traps at E-c-0.25, 0.8, and 1.4 eV associated with Ga interstitials, gallium-oxygen divacancies V-Ga-V-O, and oxygen vacancies V-O. Similar defects were observed in C implanted samples. The PAS results can also be interpreted by assuming that the observed changes are due to the introduction of V-Ga and V-Ga-V-O.
引用
收藏
页数:9
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