Global simulation of the Czochralski silicon crystal growth in ANSYS FLUENT

被引:32
|
作者
Kirpo, Maksims [1 ]
机构
[1] Bosch Solar Energy AG, D-99310 Arnstadt, Germany
关键词
Computer simulation; Turbulent convection; Czochralski method; Semiconducting Silicon; OXYGEN-TRANSPORT; CONVECTION; DESIGN; FIELD; FLOW; MM;
D O I
10.1016/j.jcrysgro.2013.02.005
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Silicon crystals for high efficiency solar cells are produced mainly by the Czochralski (CZ) crystal growth method. Computer simulations of the CZ process established themselves as a basic tool for optimization of the growth process which allows to reduce production costs keeping high quality of the crystalline material. The author shows the application of the general Computational Fluid Dynamics (CFD) code ANSYS FLUENT to solution of the static two-dimensional (2D) axisymmetric global model of the small industrial furnace for growing of silicon crystals with a diameter of 100 mm. The presented numerical model is self-sufficient and incorporates the most important physical phenomena of the CZ growth process including latent heat generation during crystallization, crystal-melt interface deflection, turbulent heat and mass transport, oxygen transport, etc. The demonstrated approach allows to find the heater power for the specified pulling rate of the crystal but the obtained power values are smaller than those found in the literature for the studied furnace. However, the described approach is successfully verified with the respect to the heater power by its application for the numerical simulations of the real CZ pullers by "Bosch Solar Energy AG". (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:60 / 69
页数:10
相关论文
共 50 条
  • [1] Global simulation of a Czochralski furnace for silicon crystal growth against the assumed thermophysical properties
    Li, Y. R.
    Yu, C. J.
    Wu, S. Y.
    Peng, L.
    Imaishi, N.
    CRYSTAL RESEARCH AND TECHNOLOGY, 2006, 41 (07) : 636 - 644
  • [2] Global simulation of coupled carbon and oxygen transport in a Czochralski furnace for silicon crystal growth
    Gao, B.
    Kakimoto, K.
    JOURNAL OF CRYSTAL GROWTH, 2010, 312 (20) : 2972 - 2976
  • [3] Time-dependent simulation of Czochralski silicon crystal growth
    Jarvinen, J
    Nieminen, R
    Tiihonen, T
    JOURNAL OF CRYSTAL GROWTH, 1997, 180 (3-4) : 468 - 476
  • [4] Review of simulation and modeling techniques for silicon Czochralski crystal growth
    Dezfoli, Amir Reza Ansari
    JOURNAL OF CRYSTAL GROWTH, 2024, 648
  • [5] Global simulation of a silicon Czochralski furnace
    Li, MW
    Li, YR
    Imaishi, N
    Tsukada, T
    JOURNAL OF CRYSTAL GROWTH, 2002, 234 (01) : 32 - 46
  • [6] Modeling and Simulation Design of Single Crystal Silicon Growth by Czochralski Method
    Xie, Ruidong
    Ma, Wenle
    Zhang, Zheqi
    Zhu, Pei
    Yi, Yingmin
    2024 5TH INTERNATIONAL CONFERENCE ON MECHATRONICS TECHNOLOGY AND INTELLIGENT MANUFACTURING, ICMTIM 2024, 2024, : 44 - 49
  • [7] Global simulation of silicon crystal Czochralski growth. I. Characteristics of heat transfer and fluid flow
    Li, Yourong
    Ruan, Dengfang
    Peng, Lan
    Wu, Shuangying
    Cailiao Yanjiu Xuebao/Chinese Journal of Materials Research, 2004, 18 (02): : 212 - 218
  • [8] Parallel simulation of Czochralski crystal growth
    Lukanin, D
    Kalaev, V
    Zhmakin, A
    PARALLEL PROCESSING AND APPLIED MATHEMATICS, 2004, 3019 : 469 - 474
  • [9] Transient simulation of grown-in defect dynamics in Czochralski crystal growth of silicon
    Mori, T
    Wang, ZH
    Brown, RA
    HIGH PURITY SILICON VI, 2000, 4218 : 118 - 128
  • [10] Numerical simulation on the effect of rotation in a Czochralski silicon crystal growth with a turbulence model
    Yu, Hui-Ping
    Sui, Yun-Kang
    Zhang, Feng-Yi
    Chang, Xin-An
    An, Guo-Ping
    Rengong Jingti Xuebao/Journal of Synthetic Crystals, 2004, 33 (05): : 835 - 840