Selective area oxidation of Si3N4 with an ambient scanning tunneling microscope

被引：6
|
作者：
Day, HC
Allee, DR
机构：
[1] Department of Electrical Engineering, Arizona State University, Tempe
来源：
NANOTECHNOLOGY | 1996年 / 7卷 / 02期
关键词：
D O I：
10.1088/0957-4484/7/2/002
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A scanning tunneling microscope tip has been used to selectively write oxidation patterns on a thin Si3N4 film on p(+) silicon. After etching the patterns in hydrofluoric acid, trenches are observed, consistent with silicon consumption in the oxidation process. The patterns in the nitride film could be transferred to the underlying silicon with an ammonium fluoride etch.
引用
收藏
页码：106 / 109
页数：4
相关论文
共 50 条
  • [21] Low temperature heat capacity measurements of β-Si3N4 and γ-Si3N4: Determination of the equilibrium phase boundary between β-Si3N4 and γ-Si3N4
    Nishiyama, Norimasa
    Kitani, Suguru
    Ohta, Yuki
    Kulik, Eleonora
    Netriova, Zuzana
    Holzheid, Astrid
    Lences, Zoltan
    Kawaji, Hitoshi
    Wakai, Fumihiro
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2020, 40 (16) : 6309 - 6315
  • [22] Effect of long-term oxidation on creep and failure of Si3N4 and Si3N4/SiC nanocomposites
    Rendtel, P
    Rendtel, A
    Hübner, H
    Klemm, H
    Herrmann, M
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1999, 19 (02) : 217 - 226
  • [23] Laser surface nanostructuring for reliable Si3N4/Si3N4 and Si3N4/Invar joined components
    Salvo, Milena
    Casalegno, Valentina
    Suess, Manuela
    Gozzelino, Laura
    Wilhelmi, Christian
    CERAMICS INTERNATIONAL, 2018, 44 (16) : 20596 - 20597
  • [24] Wettability of PdNi(Co)-Cr alloys on Si3N4 ceramic and joining of Si3N4 to Si3N4
    Xiong, Hua-Ping
    Chen, Bo
    Guo, Wan-Lin
    Ye, Lei
    WELDING IN THE WORLD, 2015, 59 (01) : 33 - 44
  • [25] β-Si3N4及添加β-Si3N4的α-Si3N4的气氛加压烧结
    张宝林
    庄汉锐
    罗新宇
    李文兰
    硅酸盐通报, 1999, (02) : 37 - 41+47
  • [26] Investigation of Si3N4–TiN/Si3N4–Si3N4 trilayer composites with residual surface compression
    Jow Lay Huang
    Feng Chi Chou
    Horng Hwa Lu
    Journal of Materials Research, 1997, 12 : 2357 - 2365
  • [27] Laser surface nanostructuring for reliable Si3N4/Si3N4 and Si3N4/Invar joined components
    Salvo, Milena
    Casalegno, Valentina
    Suess, Manuela
    Gozzelino, Laura
    Wilhelmi, Christian
    CERAMICS INTERNATIONAL, 2018, 44 (11) : 12081 - 12087
  • [28] Patterning Si3N4 and TiN with scanning probe lithography
    Chien, FSS
    You, YC
    Yao, BC
    Hsieh, J
    Lai, DY
    Lai, CS
    Jeng, D
    2003 THIRD IEEE CONFERENCE ON NANOTECHNOLOGY, VOLS ONE AND TWO, PROCEEDINGS, 2003, : 785 - 788
  • [29] Wettability of PdNi(Co)-Cr alloys on Si3N4 ceramic and joining of Si3N4 to Si3N4
    Hua-Ping Xiong
    Bo Chen
    Wan-Lin Guo
    Lei Ye
    Welding in the World, 2015, 59 : 33 - 44
  • [30] ISOTOPIC STUDIES OF OXIDATION OF SI3N4 AND SI USING SIMS
    DU, HH
    HOUSER, CA
    TRESSLER, RE
    SPEAR, KE
    PANTANO, CG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (02) : 741 - 742
12345