SOI material technology using plasma immersion ion implantation

被引：3
|
作者：
Lu, X [1 ]
Iyer, SSK [1 ]
Min, J [1 ]
Fan, Z [1 ]
Liu, JB [1 ]
Chu, PK [1 ]
Hu, C [1 ]
Chueng, NW [1 ]
机构：
[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,PLASMA ASSISTED MAT PROC LAB,BERKELEY,CA 94720
来源：
1996 IEEE INTERNATIONAL SOI CONFERENCE PROCEEDINGS | 1996年
关键词：
D O I：
10.1109/SOI.1996.552487
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：48 / 49
页数：2
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