Method of the coating thickness and transmittance control during the film deposition process

被引：1
|
作者：
Uhov, A. A. [1 ]
Komlev, A. E. [1 ]
Gerasimov, V. A. [1 ]
Karzin, V. V. [1 ]
Kostrin, D. K. [1 ]
Selivanov, L. M. [1 ]
Simon, V. A. [1 ]
机构：
[1] St Petersburg Electrotech Univ LETI, St Petersburg 197376, Russia
来源：
26TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2019年 / 1313卷
关键词：
D O I：
10.1088/1742-6596/1313/1/012056
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A method of the coating thickness and transmittance control during the film deposition is proposed. The photometric setup on the basis of vacuum resistive evaporation installation is presented. The stages of the spectral data processing algorithm are described. The substrate holder carousel is shown as part of the installation.
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页数：5
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