COMPUTATIONAL METHOD FOR DETERMINING N AND K FOR THIN FILM FROM MEASURED REFLECTANCE TRANSMITTANCE AND FILM THICKNESS

被引：90
作者：
BENNETT, JM
BOOTY, MJ
机构：
来源：
APPLIED OPTICS | 1966年 / 5卷 / 01期
关键词：
D O I：
10.1364/AO.5.000041
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
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页码：41 / &
相关论文
共 10 条
[1]  
ABELES F, 1963, PROGRESS OPTICS, V2, P268
[2]   PRECISION MEASUREMENT OF ABSOLUTE SPECULAR REFLECTANCE WITH MINIMIZED SYSTEMATIC ERRORS [J].
BENNETT, HE ;
KOEHLER, WF .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1960, 50 (01) :1-6
[3]   PRECISE METHOD FOR MEASURING ABSOLUTE PHASE CHANGE ON REFLECTION [J].
BENNETT, JM .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1964, 54 (05) :612-&
[4]   INTRINSIC OPTICAL ABSORPTION IN SINGLE-CRYSTAL GERMANIUM AND SILICON AT 77-DEGREES-K AND 300-DEGREES-K [J].
DASH, WC ;
NEWMAN, R .
PHYSICAL REVIEW, 1955, 99 (04) :1151-1155
[5]  
Hass G., 1963, AM I PHYSICS HDB, P6
[6]  
HEAVENS OS, 1955, OPTICAL PROPERTIES T, P138
[7]  
KOEHLER NF, 1955, J OPT SOC AM, V45, P934
[8]  
MALE D, 1950, CR HEBD ACAD SCI, V230, P1349
[9]   OPTICAL CONSTANTS OF SILICON IN THE REGION 1 TO 10 EV [J].
PHILIPP, HR ;
TAFT, EA .
PHYSICAL REVIEW, 1960, 120 (01) :37-38
[10]  
WOLF E, 1963, PROGRESS OPTICS, V2, P268
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