Lead Chalcogenide Films Grown by Pulsed Laser Deposition

被引:0
|
作者
Virt, I. S. [1 ,2 ]
Tur, Y. [1 ]
Potera, P. [2 ]
Virt, I. S. [1 ,2 ]
Lusakowska, E. [3 ]
Luka, G. [3 ]
机构
[1] Drogobych State Pedag Univ, Drogobych, Ukraine
[2] Univ Rzeszow, Rzeszow, Poland
[3] Inst Phys PAS, Warsaw, Poland
关键词
chalcogenide films; surface roughness; power spectral density analysis; pulsed lased deposition;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Three lead chalcogenide films, PbTe, PbSe, and PbS, with a high structural quality were grown by pulsed lased deposition. The films were grown on single crystal substrates (Si, KCl, Al2O3) and on Si covered with a Si3N4 buffer layer. The Si3N4 layer latter facilitated the lead chalcogenide layer nucleation during the first growth stages and resulted in a more homogeneous surface morphology and a lower surface roughness. The surface geometry (roughness) of the films grown on Si3N4 was studied by means of the power spectral density analysis.
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页数:3
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