The chemical stability of graphene and other free-standing two-dimensional crystals means that they can be stacked in different combinations to produce a new class of functional materials, designed for specific device applications. Here we report resonant tunnelling of Dirac fermions through a boron nitride barrier, a few atomic layers thick, sandwiched between two graphene electrodes. The resonance occurs when the electronic spectra of the two electrodes are aligned. The resulting negative differential conductance in the device characteristics persists up to room temperature and is gate voltage-tuneable due to graphene's unique Dirac-like spectrum. Although conventional resonant tunnelling devices comprising a quantum well sandwiched between two tunnel barriers are tens of nanometres thick, the tunnelling carriers in our devices cross only a few atomic layers, offering the prospect of ultra-fast transit times. This feature, combined with the multi-valued form of the device characteristics, has potential for applications in high-frequency and logic devices.
机构:
Univ Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, FranceUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
Alarcon, Alfonso
Viet-Hung Nguyen
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UJF Grenoble 1, SP2M, L Sim, UMR E CEA,INAC, F-38054 Grenoble, France
Inst Phys, Hanoi, VietnamUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
Viet-Hung Nguyen
Berrada, Salim
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Univ Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, FranceUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
Berrada, Salim
Querlioz, Damien
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Univ Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, FranceUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
Querlioz, Damien
Saint-Martin, Jerome
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Univ Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, FranceUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
Saint-Martin, Jerome
Bournel, Arnaud
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Univ Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, FranceUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
Bournel, Arnaud
Dollfus, Philippe
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Univ Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, FranceUniv Paris 11, CNRS, Inst Fundamental Elect, UMR 8622, F-91405 Orsay, France
机构:
INAC, SP2M, UMR E CEA, UJF Grenoble 1, F-38054 Grenoble, France
VAST, Ctr Computat Phys, Inst Phys, Hanoi 10000, VietnamINAC, SP2M, UMR E CEA, UJF Grenoble 1, F-38054 Grenoble, France
Nguyen, V. Hung
Niquet, Y. M.
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INAC, SP2M, UMR E CEA, UJF Grenoble 1, F-38054 Grenoble, FranceINAC, SP2M, UMR E CEA, UJF Grenoble 1, F-38054 Grenoble, France
Niquet, Y. M.
Dollfus, P.
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Univ Paris 11, Inst Elect Fondamentale, CNRS, UMR8622, F-91405 Orsay, FranceINAC, SP2M, UMR E CEA, UJF Grenoble 1, F-38054 Grenoble, France
机构:
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
Univ Sci & Technol China, Dept Phys, Hefei 230026, Peoples R China
USTC CityU Joint Adv Res Ctr, Suzhou 215123, Peoples R ChinaCity Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
Zhang, Huan
Chan, K. S.
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City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
Chan, K. S.
Lin, Zijing
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Univ Sci & Technol China, Dept Phys, Hefei 230026, Peoples R ChinaCity Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China