A study of vertical lithography for high-density 3D structures

被引:6
|
作者
Hirai, Shin-Ichiro [1 ]
Saito, Nobuyuki [1 ]
Goto, Yoshio [1 ]
Suda, Hiromi [1 ]
Mori, Ken-Ichiro [1 ]
Miura, Seiya [1 ]
机构
[1] Canon Inc, Utsunomiya, Tochigi 3213292, Japan
来源
关键词
More than Moore; TSV; back-side alignment; plating; wafer edge shielding; wafer edge exposure; bonded wafer;
D O I
10.1117/12.917877
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
3D stacking technology using TSVs, as well as linewidth shrinking, is crucial for future progress in semiconductor devices. A new i-line exposure tool, the FPA-5510iV, has been developed which provides the functions necessary for implementing TSV processes. This paper reports on Canon's commitment to make advanced TSV processes a reality.
引用
收藏
页数:9
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