Dependence of carrier concentrations on oxygen pressure for Ga-doped ZnO prepared by ion plating method

被引:71
|
作者
Yamamoto, I
Sakemi, I
Awai, K
Shirakata, S
机构
[1] Kochi Univ Technol, Mat Design Ctr, Kochi 7828502, Japan
[2] Sumitomo Heavy Ind Ltd, Res & Dev Ctr, Niihama, Ehime 7928588, Japan
[3] Sumiju Tech Ctr Co Ltd, Niihama, Ehime 7928588, Japan
[4] Ehime Univ, Fac Engn, Matsuyama, Ehime 7908577, Japan
关键词
ZnO; Ga; thin film; ion plating system;
D O I
10.1016/j.tsf.2003.10.138
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transparent and conductive Ga-doped ZnO films have been deposited at a glass substrate temperature of 200 degreesC using an ion plating system. The resistivity as low as 2.7 X 10(-4) Omega cm with a high carrier concentration of 8 X 10(20) cm(-3), Hall mobility of 27 cm(2) (V s)(-1) and high average transmittance above 90% in the visible range were obtained from the film deposited under reducing conditions using ZnO:Ga2O3 tablets with a Ga2O3 content of 3 wt.%. Under reducing conditions, carrier concentration decreases very slowly with increasing oxygen partial pressure. Excess oxygen partial pressure substantially decreases both carrier concentration and Hall mobility in the films. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:439 / 442
页数:4
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