Influence of Gate Depletion Layer Width on Radiation Resistance of Silicon Carbide Junction Field-Effect Transistors

被引:0
|
作者
Takeyama, Akinori [1 ]
Makino, Takahiro [1 ]
Tanaka, Yasunori [2 ]
Kuroki, Shin-Ichiro [3 ]
Ohshima, Takeshi [1 ]
机构
[1] Natl Inst Quantum & Radiol Sci & Technol, 1233 Watanuki Machi, Takasaki, Gumma 3701292, Japan
[2] Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba 3058560, Japan
[3] Hiroshima Univ, Res Inst Nanodevices, 1-4-2 Kagamiyama, Higashihiroshima 7398527, Japan
关键词
SiC; JFET; gamma rays; threshold voltage shift; depletion layer width; GAMMA; JFET; CAPACITANCE; DEPENDENCE; OPERATION; DOSIMETER; CLEAR;
D O I
10.3390/qubs7040031
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Silicon carbide junction field-effect transistors (SiC JFETs) are promising candidates as devices applicable to radiation conditions, such as the decommissioning of nuclear facilities or the space environment. We investigate the origin of the threshold volage (Vth) shift and hysteresis of differently structured SiC JFETs. A large positive Vth shift and hysteresis are observed for a depletion-type JFET with a larger depletion layer width. With changing the sweep range of the gate voltage and depletion width, the Vth shift was positively proportional to the difference between the channel depth and depletion width (channel depth-gate depletion width). By illuminating the sub-band gap light, the Vth of the irradiated depletion JFETs recovers close to nonirradiated ones, while a smaller shift and hysteresis are observed for the enhancement type with a narrower width. It can be interpreted that positive charges generated in a gate depletion layer cause a positive Vth shift. When they are swept out from the depletion layer and trapped in the channel, this gives rise to a further Vth shift and hysteresis in gamma-irradiated SiC JFETs.
引用
收藏
页数:10
相关论文
共 50 条
  • [41] BURNOUT OF JUNCTION FIELD-EFFECT TRANSISTORS
    LONG, DM
    SWANT, DH
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1973, NS20 (06) : 149 - 157
  • [42] RADIATION INFLUENCE ON ELECTRICAL CHARACTERISTICS OF COMPLEMENTARY JUNCTION FIELD-EFFECT TRANSISTORS EXPLOITED AT LOW TEMPERATURES
    Lovshenko, I. Yu
    Khanko, V. T.
    Stempitsky, V. R.
    MATERIALS PHYSICS AND MECHANICS, 2018, 39 (01): : 92 - 101
  • [43] EXCESS GATE-LEAKAGE CURRENT OF INGAAS JUNCTION FIELD-EFFECT TRANSISTORS
    OHNAKA, K
    SHIBATA, J
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (09) : 4714 - 4717
  • [44] EFFECTS OF ELECTRON-BOMBARDMENT ON NOISE IN JUNCTION GATE FIELD-EFFECT TRANSISTORS
    KRISHNAN, IN
    CHEN, TM
    SOLID-STATE ELECTRONICS, 1973, 16 (11) : 1233 - 1240
  • [45] Electric Double Layer Gate Field-Effect Transistors Based on Si
    Yanase, Takashi
    Shimada, Toshihiro
    Hasegawa, Tetsuya
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (04)
  • [46] Pentacene organic field-effect transistors with polyimide gate dielectric layer
    Dong, Mao-Jun
    Tao, Chun-Lan
    Zhang, Xu-Hui
    Ou, Gu-Ping
    Zhang, Fu-Jia
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2008, 19 (02): : 161 - 163
  • [47] ALPHA-SIC BURIED-GATE JUNCTION FIELD-EFFECT TRANSISTORS
    KELNER, G
    BINARI, S
    SHUR, M
    SLEGER, K
    PALMOUR, J
    KONG, H
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 11 (1-4): : 121 - 124
  • [48] CURRENT SATURATION AND DRAIN CONDUCTANCE OF JUNCTION-GATE FIELD-EFFECT TRANSISTORS
    WU, SY
    SAH, CT
    SOLID-STATE ELECTRONICS, 1967, 10 (06) : 593 - &
  • [49] GENERATION-RECOMBINATION NOISE OF JUNCTION-GATE FIELD-EFFECT TRANSISTORS
    BOCTOR, WJ
    PRASAD, S
    PROCEEDINGS OF THE INSTITUTION OF ELECTRICAL ENGINEERS-LONDON, 1974, 121 (12): : 1457 - 1459
  • [50] RADIATION EFFECTS IN ENHANCEMENT MODE GAAS JUNCTION FIELD-EFFECT TRANSISTORS
    ZULEEG, R
    NOTTHOFF, JK
    LEHOVEC, K
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1977, 24 (06) : 2305 - 2308