Influence of Gate Depletion Layer Width on Radiation Resistance of Silicon Carbide Junction Field-Effect Transistors

被引:0
|
作者
Takeyama, Akinori [1 ]
Makino, Takahiro [1 ]
Tanaka, Yasunori [2 ]
Kuroki, Shin-Ichiro [3 ]
Ohshima, Takeshi [1 ]
机构
[1] Natl Inst Quantum & Radiol Sci & Technol, 1233 Watanuki Machi, Takasaki, Gumma 3701292, Japan
[2] Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba 3058560, Japan
[3] Hiroshima Univ, Res Inst Nanodevices, 1-4-2 Kagamiyama, Higashihiroshima 7398527, Japan
关键词
SiC; JFET; gamma rays; threshold voltage shift; depletion layer width; GAMMA; JFET; CAPACITANCE; DEPENDENCE; OPERATION; DOSIMETER; CLEAR;
D O I
10.3390/qubs7040031
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Silicon carbide junction field-effect transistors (SiC JFETs) are promising candidates as devices applicable to radiation conditions, such as the decommissioning of nuclear facilities or the space environment. We investigate the origin of the threshold volage (Vth) shift and hysteresis of differently structured SiC JFETs. A large positive Vth shift and hysteresis are observed for a depletion-type JFET with a larger depletion layer width. With changing the sweep range of the gate voltage and depletion width, the Vth shift was positively proportional to the difference between the channel depth and depletion width (channel depth-gate depletion width). By illuminating the sub-band gap light, the Vth of the irradiated depletion JFETs recovers close to nonirradiated ones, while a smaller shift and hysteresis are observed for the enhancement type with a narrower width. It can be interpreted that positive charges generated in a gate depletion layer cause a positive Vth shift. When they are swept out from the depletion layer and trapped in the channel, this gives rise to a further Vth shift and hysteresis in gamma-irradiated SiC JFETs.
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页数:10
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