Poly-Si/a-Si/4H-SiC p-n heterojunction broadband photodetector prepared by magnetron sputtering

被引:0
|
作者
Li, Zihao [1 ]
Zhang, Mingkun [1 ,2 ]
Fu, Zhao [1 ]
Zhang, Zeyang [1 ]
Wu, Shaoxiong [1 ]
Zhang, Yuning [1 ]
Lin, Dingqu [1 ]
Hong, Rongdun [1 ,3 ]
Cai, Jiafa [1 ,3 ]
Chen, Xiaping [1 ,3 ]
Zhang, Feng [1 ,3 ]
机构
[1] Xiamen Univ, Coll Phys Sci & Technol, Dept Phys, Xiamen 361005, Peoples R China
[2] Xiamen Univ, Sch Elect Sci & Engn, Peoples Republicof China, Xiamen 361005, Peoples R China
[3] Jiujiang Res Inst Xiamen Univ, Jiujiang 332000, Peoples R China
基金
中国国家自然科学基金;
关键词
poly-Si/a-Si/4H-SiC heterojunction; broadband photodetector; energy band diagram; ULTRAVIOLET; PHOTODIODES;
D O I
10.1088/1361-6463/ad2bdb
中图分类号
O59 [应用物理学];
学科分类号
摘要
With the increasing complexity of scenarios, there is a growing need for broadband photodetectors (PDs). In this work, we report a polycrystalline-Si (poly-Si)/amorphous-Si (a-Si)/4H-SiC p-n heterojunction PD with efficient response in a broad spectral range of ultraviolet-visible-near-infrared. The poly-Si/a-Si/4H-SiC heterojunction was achieved by magnetron sputtering and annealing. The fabricated heterojunction device has a low dark current of 1 pA at -40 V and a fast response time of 3 ns due to the outstanding rectification characteristics of the heterojunction combined with narrow bandgap and wide bandgap material. In addition, the carrier behavior of the heterojunction exposed to broadband light is analyzed in detail by constructing the energy band diagram.
引用
收藏
页数:8
相关论文
共 50 条
  • [21] Preparation of (n)a-Si:H/(p)c-Si heterojunction solar cells
    Borchert, D
    Grabosch, G
    Fahrner, WR
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1997, 49 (1-4) : 53 - 59
  • [22] Magnetron sputtering of epitaxial ZrB2 thin films on 4H-SiC(0001) and Si(111)
    Tengdelius, Lina
    Birch, Jens
    Lu, Jun
    Hultman, Lars
    Forsberg, Urban
    Janzen, Erik
    Hogberg, Hans
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 211 (03): : 636 - 640
  • [23] Bias-dependent photocurrent collection in p-i-n a-Si:H/SiC:H heterojunction
    Louro, P
    Vieira, M
    Vygranenko, Y
    Fernandes, M
    Schwarz, R
    Schubert, M
    SENSORS AND ACTUATORS A-PHYSICAL, 2002, 97-8 : 221 - 226
  • [24] Bipolar conduction across a wafer bonded p-n Si/SiC heterojunction
    Gammon, P. M.
    Perez-Tomas, A.
    Jennings, M. R.
    Sanchez, A. M.
    Fisher, C.
    Thomas, S. T.
    Donnellan, B. T.
    Mawby, P. A.
    SILICON CARBIDE AND RELATED MATERIALS 2012, 2013, 740-742 : 1006 - +
  • [25] PHOTOCONDUCTIVE a-Si:H WITH DOMINANT MONOHYDRIDE BONDING PREPARED BY DC-MAGNETRON SPUTTERING.
    Druesedau, T.
    Eckler, M.
    Bindemann, R.
    Physica Status Solidi (A) Applied Research, 1988, 108 (01): : 285 - 293
  • [26] Annealing effect on the activation of 1.54 μn emission from erbium in a-Si:H matrix prepared by DC magnetron sputtering
    Andreev, AA
    Golubev, VG
    Medvedev, AV
    Pevtsov, AB
    Voronkov, VB
    AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 : 297 - 302
  • [27] Comparison of (n plus ) a-Si:H/(p) c-Si heterojunction emitters using a-Si:H films deposited by PECVD or HWCVD
    Martin, Isidro
    Munoz, Delfina
    Voz, Cristobal
    Vetter, Michael
    Alcubilla, Ramon
    Damon-Lacoste, Jerome
    Roca i Cabarrocas, Pere
    Villar, Fernando
    Bertomeu, Joan
    Andreu, Jordi
    CONFERENCE RECORD OF THE 2006 IEEE 4TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION, VOLS 1 AND 2, 2006, : 1091 - 1094
  • [28] Novel power Si/4H-SiC heterojunction tunneling transistor (HETT)
    Hayashi, Tetsuya
    Shimoida, Yoshio
    Tanaka, Hideaki
    Yamagami, Shigeharu
    Tanimoto, Satoshi
    Hoshi, Masakatsu
    SILICON CARBIDE AND RELATED MATERIALS 2005, PTS 1 AND 2, 2006, 527-529 : 1453 - +
  • [29] On the crystallization behavior of sputter-deposited a-Si films on 4H-SiC
    Triendl, F.
    Pfusterschmied, G.
    Fleckl, G.
    Schwarz, S.
    Schmid, U.
    THIN SOLID FILMS, 2020, 697
  • [30] Quantum size effects of a-Si(:H)/a-SiC(:H) multilayer films prepared by rf sputtering
    Suzaki, Yoshifumi
    Shikama, Tomokazu
    Kakiuchi, Hiroaki
    Yoshii, Kumayasu
    Kawabe, Hideaki
    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 1994, 60 (03): : 393 - 396