ZnO with p-Type Doping: Recent Approaches and Applications

被引:20
|
作者
Yang, Ruqi [1 ]
Wang, Fengzhi [1 ,2 ]
Lu, Jianguo [1 ,2 ]
Lu, Yangdan [1 ]
Lu, Bojing [1 ]
Li, Siqin [1 ]
Ye, Zhizhen [1 ,2 ]
机构
[1] University, Sch Mat Sci & Engn, State Key Lab Silicon & Adv Semicond Mat, Hangzhou 310027, Zhejiang, Peoples R China
[2] Zhejiang Univ, Inst Wenzhou, Wenzhou Key Lab Novel Optoelect & Nano Mat, Wenzhou 325006, Peoples R China
关键词
ZnO; p-type conduction; doping concentration; acceptor level; self-compensation; LIGHT-EMITTING-DIODES; THIN-FILMS; DUAL IMPLANTATION; FORMATION MECHANISM; OXYGEN VACANCIES; TEMPERATURE; HOMOJUNCTION; FABRICATION; NITROGEN; NANORODS;
D O I
10.1021/acsaelm.3c00515
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
ZnOis a significant semiconductor material with the characteristicsof direct band gap, large exciton binding energy, and easy growthof high-quality nanostructures, and it is widely used in various fields.However, obtaining high-quality p-type ZnO has become a significantobstacle to the wide application of ZnO. The research on p-ZnO startedseveral decades ago and is regarded as the research focus. Many researchershave obtained high-quality p-ZnO by chemical vapor deposition (CVD)and physical vapor deposition (PVD). To obtain high-quality p-ZnO,researchers have used some "better" techniques to improvethe crystal quality and mobility of p-ZnO, such as molecular beamepitaxy (MBE) and post-treatment. This review provides an overviewof some methods for obtaining high-quality p-ZnO, such as increasingthe acceptor concentration, shallowing acceptor energy levels, andreducing donor defects. In addition, we also review the applicationsof p-ZnO in LEDs, UV detectors, thin-film transistors, gas sensing,bionic materials, and other fields.
引用
收藏
页码:4014 / 4034
页数:21
相关论文
共 50 条
  • [1] Development in p-type Doping of ZnO
    俞丽萍
    朱其锵
    Journal of Wuhan University of Technology(Materials Science Edition), 2012, 27 (06) : 1184 - 1187
  • [2] Development in p-type Doping of ZnO
    Yu Liping
    Zhu Qiqiang
    Fan Dayong
    Lan Zili
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2012, 27 (06): : 1184 - 1187
  • [3] Doping engineering of p-type ZnO
    Marfaing, Y
    Lusson, A
    SUPERLATTICES AND MICROSTRUCTURES, 2005, 38 (4-6) : 385 - 396
  • [4] p-type doping and compensation in ZnO
    Lee, Woo-Jin
    Kang, Joongoo
    Chang, K. J.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 53 (01) : 196 - 201
  • [5] Development in p-type Doping of ZnO
    Liping Yu
    Qiqiang Zhu
    Dayong Fan
    Zili Lan
    Journal of Wuhan University of Technology-Mater. Sci. Ed., 2012, 27 : 1184 - 1187
  • [6] RECENT ADVANCES AND NOVEL APPROACHES OF P-TYPE DOPING OF ZINC OXIDE
    Maksimov, Oleg
    REVIEWS ON ADVANCED MATERIALS SCIENCE, 2010, 24 (1-2) : 26 - 34
  • [7] Location of P and As dopants and p-type doping of ZnO
    Fons, P.
    Kolobov, A. V.
    Tominaga, Junji
    Hyot, Berangere
    Andre, Bernard
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2014, 16 (1-2): : 1 - 5
  • [8] Activities towards p-type doping of ZnO
    Brauer, G.
    Kuriplach, J.
    Ling, C. C.
    Djurisic, A. B.
    INTERNATIONAL WORKSHOP ON POSITRON STUDIES OF DEFECTS (PSD 08), 2011, 265
  • [9] P-type doping and devices based on ZnO
    Look, DC
    Claftin, B
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2004, 241 (03): : 624 - 630
  • [10] Recent advances in research on p-type ZnO
    Ye, ZZ
    Zhang, YZ
    Xu, WZ
    Lu, JG
    JOURNAL OF INORGANIC MATERIALS, 2003, 18 (01) : 11 - 18