Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width-Controlled Deposition by High-Power Impulse Magnetron Sputtering

被引:3
|
作者
Najafi-Ashtiani, Hamed [1 ,2 ]
Bilek, Marcela M. [1 ,3 ,4 ,5 ]
Akhavan, Behnam [1 ,3 ,4 ,6 ,7 ]
机构
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] Velayat Univ, Fac Basic Sci, Dept Phys, Iranshahr, Iran
[3] Univ Sydney, Sch Biomed Engn, Sydney, NSW 2006, Australia
[4] Univ Sydney, Nano Inst, Sydney, NSW 2006, Australia
[5] Univ Sydney, Charles Perkins Ctr, Sydney, NSW 2006, Australia
[6] Univ Newcastle, Sch Engn, Callaghan, NSW 2308, Australia
[7] Hunter Med Res Inst HMRI, Precis Med Program, New Lambton Hts, NSW 2305, Australia
基金
澳大利亚研究理事会;
关键词
coatings; electrochromics; high-power impulse magnetron sputtering; pulse lengths; tungsten; WO3; ELECTRICAL-PROPERTIES; WO3; FILMS; BAND-GAP; COATINGS; HIPIMS; PERFORMANCE; NANOCOMPOSITE; COLORATION; STABILITY; EVOLUTION;
D O I
10.1002/adem.202301378
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tungsten oxide (WO3) thin films have been of prime interest among electrochromic materials because of their chemical stability, strong adherence to various substrates, and high coloration efficiency. High-power impulse magnetron sputtering (HiPIMS) holds great potential in fabricating durable WO3-based electrochromic layers. However, the tungsten target-plasma interactions in reactive-HiPIMS deposition of WO3 and their role in modulating the electrochromic function of the resulting WO3 coatings are yet to be understood. Herein, by controlling the HiPIMS pulse length, the stoichiometry of tungsten oxide structures can be tuned to optimize the transparency and electrochromic function of the coatings. X-ray photoelectron spectroscopy data shows that at pulse lengths shorter than 85 mu s, the concentration of suboxide compounds is less than that of tungsten trioxide, while for pulse lengths longer than 100 mu s, this balance is reversed. The average optical transparency of the coatings in the range of visible light is higher than 80%. The optical transmittance modulation (Delta T) of 38.1, 36.2, and 34.3% and coloration efficiency of 41.3, 38.4, and 35.9 cm2 C-1 are measured for the WOx samples deposited at pulse lengths of 70, 85, and 100 mu s, respectively. Tuning the HiPIMS pulse characteristics is a simple strategy to deposit tungsten oxide films with tuned electrochromic properties for an array of applications, from smart windows to wearable displays. This article reports the fabrication of tungsten oxide electrochromic coatings using reactive high-power impulse magnetron sputtering (HiPIMS). Results demonstrate the tunability of tungsten oxide structures via HiPIMS pulse length, optimizing coating transparency and electrochromic properties. Tuning HiPIMS pulse characteristics offers a straightforward approach to deposit tailored tungsten oxide films for diverse engineering applications, including smart windows and wearable displays.image (c) 2024 WILEY-VCH GmbH
引用
收藏
页数:11
相关论文
共 50 条
  • [31] Effect of pulse interval on deposition of diamond-like carbon through high-power impulse magnetron sputtering
    Ohta, Takayuki
    Kunieda, Hiro
    Harigai, Toru
    Oda, Akinori
    Kousaka, Hiroyuki
    DIAMOND AND RELATED MATERIALS, 2024, 148
  • [32] Control of aluminum doping of ZnO:Al thin films obtained by high-power impulse magnetron sputtering
    Tiron, V.
    Sirghi, L.
    Popa, G.
    THIN SOLID FILMS, 2012, 520 (13) : 4305 - 4309
  • [33] Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering
    Bakhit, Babak
    Petrov, Ivan
    Greene, J. E.
    Hultman, Lars
    Rosen, Johanna
    Greczynski, Grzegorz
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2018, 36 (03):
  • [34] Structures and electrochromic properties of tungsten oxide films prepared by magnetron sputtering
    Yang, TS
    Lin, ZR
    Wong, MS
    APPLIED SURFACE SCIENCE, 2005, 252 (05) : 2029 - 2037
  • [35] Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method
    Wiatrowski, A.
    Kijaszek, W.
    Posadowski, W. M.
    Oleszkiewicz, W.
    Jadczak, J.
    Kunicki, P.
    DIAMOND AND RELATED MATERIALS, 2017, 72 : 71 - 76
  • [36] Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
    Vlcek, J.
    Rezek, J.
    Houska, J.
    Kozak, T.
    Kohout, J.
    VACUUM, 2015, 114 : 131 - 141
  • [37] Energy-enhanced deposition of copper thin films by bipolar high power impulse magnetron sputtering
    Velicu, Ioana-Laura
    Ianos, Gabriela-Theodora
    Porosnicu, Corneliu
    Mihaila, Ilarion
    Burducea, Ion
    Velea, Alin
    Cristea, Daniel
    Munteanu, Daniel
    Tiron, Vasile
    SURFACE & COATINGS TECHNOLOGY, 2019, 359 (97-107): : 97 - 107
  • [38] An introduction to thin film processing using high-power impulse magnetron sputtering
    Daniel Lundin
    Kostas Sarakinos
    Journal of Materials Research, 2012, 27 : 780 - 792
  • [39] Transparent Conductive Dielectric-Metal-Dielectric Structures for Electrochromic Applications Fabricated by High-Power Impulse Magnetron Sputtering
    Najafi-Ashtiani, Hamed
    Akhavan, Behnam
    Jing, Fengjuan
    Bilek, Marcela M.
    ACS APPLIED MATERIALS & INTERFACES, 2019, 11 (16) : 14871 - 14881
  • [40] An introduction to thin film processing using high-power impulse magnetron sputtering
    Lundin, Daniel
    Sarakinos, Kostas
    JOURNAL OF MATERIALS RESEARCH, 2012, 27 (05) : 780 - 792