Overcoming Embedded Memory Test & Repair Challenges in the Gate-All-Around Era

被引:2
|
作者
Ghukasyan, Artur [1 ]
Tshagharyan, Grigor [1 ]
Harutyunyan, Gurgen [1 ]
Zorian, Yervant [2 ]
机构
[1] Synopsys, Yerevan, Armenia
[2] Synopsys, Mountain View, CA USA
来源
2023 IEEE 41ST VLSI TEST SYMPOSIUM, VTS | 2023年
关键词
fault modeling; embedded memory; test and repair; gate-all-around; inductive fault analysis; NANOWIRE MOSFETS; PERFORMANCE;
D O I
10.1109/VTS56346.2023.10140110
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The paper discusses the challenges that memory testing faces in the era of Gate-All-Around transistor technology and proposes a solution concept to overcome them. With the transition from two-dimensional to three-dimensional transistors, and in particular with the advent of FinFET, many new factors have entered the scene, creating a need for new testing techniques capable of coping with the complexity of novel memory designs. However, the end of the FinFET era and the beginning of a new Gate-All-Around design paradigm means that these methods need to be revisited to ensure they remain effective and in line with the latest transistor technologies that are contenders to replace FinFET. The paper assesses the test challenges associated with the Gate-All-Around technology and proposes a solution concept that sets a vector for a thorough investigation of underlying defects, fault modeling, and the development of efficient test and repair algorithms.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] An embedded gate gate-all-around FinFET for biosensing application
    Jia, Hujun
    Yang, Wanli
    Cao, Weitao
    Zhao, Linna
    Su, Qiyu
    Wei, Xingyu
    Cao, Zhen
    Yang, Yintang
    MICRO AND NANOSTRUCTURES, 2024, 195
  • [2] Gate-all-around twin silicon nanowire SONOS memory
    Suk, Sung Dae
    Yeo, Kyoung Hwan
    Cho, Keun Hwi
    Li, Ming
    Yeoh, Yun young
    Hong, Ki-Ha
    Kim, Sung-Han
    Koh, Young-Ho
    Jung, Sunggon
    Jang, WonJun
    Kim, Dong-Won
    Park, Donggun
    Ryu, Byung-Il
    2007 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, 2007, : 142 - +
  • [3] Challenges of gate stack TDDB in gate-all-around nanosheet towards further scaling
    Zhou, Huimei
    Wang, Miaomiao
    Wu, Ernest
    2024 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, IRPS 2024, 2024,
  • [4] Modeling of gate-all-around charge trapping SONOS memory cells
    Gnani, E.
    Reggiani, S.
    Gnudi, A.
    Baccarani, G.
    Fu, J.
    Singh, N.
    Lo, G. Q.
    Kwong, D. L.
    SOLID-STATE ELECTRONICS, 2010, 54 (09) : 997 - 1002
  • [5] Gate-all-around Ge FETs
    Liu, C. W.
    Chen, Y. -T.
    Hsu, S. -H.
    SIGE, GE, AND RELATED COMPOUNDS 6: MATERIALS, PROCESSING, AND DEVICES, 2014, 64 (06): : 317 - 328
  • [6] Overcoming test challenges presented by embedded flash memory
    Agin, J
    Boyce, H
    Trexler, T
    IEEE/CPMT/SEMI(R) 28TH INTERNATIONAL ELECTRONICS MANUFACTURING TECHNOLOGY SYMPOSIUM, 2003, : 197 - 200
  • [7] Gate-All-Around MOSFET Built on Void Embedded Silicon on Insulator Substrate
    Liu, Qiang
    Mu, Zhiqiang
    Liu, Chenhe
    Zhao, Lantian
    Chen, Lingli
    Yang, Yumeng
    Wei, Xing
    Yu, Wenjie
    IEEE ELECTRON DEVICE LETTERS, 2021, 42 (05) : 657 - 660
  • [8] Comparative analysis of heavy ions and alpha particles impact on gate-all-around TFETs and gate-all-around MOSFETs
    Kumar, Pankaj
    Koley, Kalyan
    Kumar, Subindu
    MICRO AND NANOSTRUCTURES, 2024, 192
  • [9] Characteristics of gate-all-around polycrystalline silicon channel SONOS flash memory
    Seo, Joo Yun
    Lee, Sang-Ho
    Park, Se Hwan
    Kim, Wandong
    Kim, Do-Bin
    Park, Byung-Gook
    INTERNATIONAL JOURNAL OF NANOTECHNOLOGY, 2014, 11 (1-4) : 116 - 125
  • [10] SiGe Gate-All-around Nanosheet Reliability
    Zhou, Huimei
    Wang, Miaomiao
    Bao, Ruqiang
    Durfee, Curtis
    Qin, Liqiao
    Zhang, Jingyun
    2022 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2022,