Light Field Manipulation and Applications of Capillary Discharge Extreme Ultraviolet Laser

被引：0
|
作者：
Cui, Huaiyu [1 ]
Yu, Pengliang [2 ]
Li, Lei [1 ]
An, Bo [1 ]
Zhao, Dongdi [1 ]
Zhao, Yongpeng [1 ]
机构：
[1] Harbin Inst Technol, Dept Optoelect Informat Sci & Technol, Harbin 150080, Peoples R China
[2] Harbin Xinguang Opt Elect Technol Co Ltd, Harbin, Peoples R China
来源：
X-RAY LASERS 2023 | 2024年 / 403卷
关键词：
Extreme ultraviolet laser; Light shaping; Laser ablation;
D O I：
10.1007/978-3-031-65913-3_13
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, the light field manipulation and applications of the capillary discharge extreme ultraviolet (EUV) laser at 46.9 nm is reported. Because of the high-quality output parameters of the 46.9 nm laser and the various light-shaping focusing of phase and amplitude, this miniaturized EUV laser is suitable for coupling into the EUV laser application system, which could reduce the experimental expense and provide sufficient experimental hours.
引用
收藏
页码：139 / 144
页数：6
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