Light Field Manipulation and Applications of Capillary Discharge Extreme Ultraviolet Laser

被引：0
|
作者：
Cui, Huaiyu [1 ]
Yu, Pengliang [2 ]
Li, Lei [1 ]
An, Bo [1 ]
Zhao, Dongdi [1 ]
Zhao, Yongpeng [1 ]
机构：
[1] Harbin Inst Technol, Dept Optoelect Informat Sci & Technol, Harbin 150080, Peoples R China
[2] Harbin Xinguang Opt Elect Technol Co Ltd, Harbin, Peoples R China
来源：
X-RAY LASERS 2023 | 2024年 / 403卷
关键词：
Extreme ultraviolet laser; Light shaping; Laser ablation;
D O I：
10.1007/978-3-031-65913-3_13
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, the light field manipulation and applications of the capillary discharge extreme ultraviolet (EUV) laser at 46.9 nm is reported. Because of the high-quality output parameters of the 46.9 nm laser and the various light-shaping focusing of phase and amplitude, this miniaturized EUV laser is suitable for coupling into the EUV laser application system, which could reduce the experimental expense and provide sufficient experimental hours.
引用
收藏
页码：139 / 144
页数：6
相关论文
共 50 条
  • [21] Investigations on the emission in the extreme ultraviolet of a pseudospark based discharge light source
    Bergmann, Klaus
    Vieker, Jochen
    von Wezyk, Alexander
    JOURNAL OF APPLIED PHYSICS, 2016, 120 (14)
  • [22] Application of capillary discharge plasma in the field of laser acceleration
    Yan, Yang
    Yang, Tong
    Guo, Zhen
    Cheng, Hao
    Li, Yuze
    Fang, Yanlu
    Xia, Yadong
    He, Qiangyou
    Li, Chentong
    Lin, Chen
    Yan, Xueqing
    CHINESE SCIENCE BULLETIN-CHINESE, 2023, 68 (16): : 2058 - 2069
  • [23] Direct manipulation of atomic excitation with intense extreme-ultraviolet laser fields
    He, Yu
    Shi, Haohan
    Xue, Nan
    Magunia, Alexander
    Sun, Shaohua
    Ding, Jingjie
    Hu, Bitao
    Liu, Zuoye
    PHYSICAL REVIEW A, 2022, 105 (04)
  • [24] Laser produced plasma for efficient extreme ultraviolet light sources
    Donnelly, Tony
    Cummins, Thomas
    Gorman, Colm O'
    Li, Bowen
    Harte, Colm S.
    O'Reilly, Fergal
    Sokell, Emma
    Dunne, Padraig
    O'Sullivan, Gerry
    17TH INTERNATIONAL CONFERENCE ON ATOMIC PROCESSES IN PLASMAS (ICAPIP), 2012, 1438 : 155 - 160
  • [25] Preface to the special topic "Extreme Ultraviolet Light Sources and Applications"
    不详
    CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG, 2024, 51 (07):
  • [26] Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources
    Schriever, Guido
    Semprez, Olivier
    Jonkers, Jeroen
    Yoshioka, Masaki
    Apetz, Rolf
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [27] PHYSICS OF FREE-ELECTRON-LASER APPLICATIONS IN THE VACUUM ULTRAVIOLET EXTREME ULTRAVIOLET - INTRODUCTION
    DEACON, DAG
    NEWNAM, BE
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1989, 6 (05) : 1061 - 1061
  • [28] Capillary discharge-pumped EUV laser and its applications
    Tomassetti, G.
    Ritucci, A.
    Reale, A.
    Zuppella, P.
    SIX INTERNATIONAL CONFERENCE OF THE BALKAN PHYSICAL UNION, 2007, 899 : 349 - +
  • [29] Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation
    Wang, Junwu
    Wang, Xinbing
    Zuo, Duluo
    FRONTIERS OF OPTOELECTRONICS, 2021, 14 (03) : 352 - 359
  • [30] Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation
    Junwu Wang
    Xinbing Wang
    Duluo Zuo
    Frontiers of Optoelectronics, 2021, 14 : 352 - 359
12345