Light Field Manipulation and Applications of Capillary Discharge Extreme Ultraviolet Laser

被引：0
|
作者：
Cui, Huaiyu [1 ]
Yu, Pengliang [2 ]
Li, Lei [1 ]
An, Bo [1 ]
Zhao, Dongdi [1 ]
Zhao, Yongpeng [1 ]
机构：
[1] Harbin Inst Technol, Dept Optoelect Informat Sci & Technol, Harbin 150080, Peoples R China
[2] Harbin Xinguang Opt Elect Technol Co Ltd, Harbin, Peoples R China
来源：
X-RAY LASERS 2023 | 2024年 / 403卷
关键词：
Extreme ultraviolet laser; Light shaping; Laser ablation;
D O I：
10.1007/978-3-031-65913-3_13
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, the light field manipulation and applications of the capillary discharge extreme ultraviolet (EUV) laser at 46.9 nm is reported. Because of the high-quality output parameters of the 46.9 nm laser and the various light-shaping focusing of phase and amplitude, this miniaturized EUV laser is suitable for coupling into the EUV laser application system, which could reduce the experimental expense and provide sufficient experimental hours.
引用
收藏
页码：139 / 144
页数：6
相关论文
共 50 条
  • [1] Advanced Applications for Capillary Discharge 46.9 nm Extreme Ultraviolet Laser
    Huaiyu, Cui
    Yujie, Shen
    Dongdi, Zhao
    Bo, An
    Yongpeng, Zhao
    CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG, 2024, 51 (07):
  • [2] The effects of the prepulse on capillary discharge extreme ultraviolet laser
    Shuker, M
    Ben-kish, A
    Nemirovsky, RA
    Fisher, A
    Ron, A
    PHYSICS OF PLASMAS, 2006, 13 (01) : 1 - 4
  • [3] Influence of current prepulse on capillary-discharge extreme-ultraviolet laser
    Tan, C. A.
    Kwek, K. H.
    PHYSICAL REVIEW A, 2007, 75 (04):
  • [4] Study of Thermal Effect in the Interaction of Nanosecond Capillary Discharge Extreme Ultraviolet Laser with Copper
    Cui, Huaiyu
    Zhao, Yongpeng
    Khan, Muhammad Usman
    Zhao, Dongdi
    Fan, Zhigang
    APPLIED SCIENCES-BASEL, 2020, 10 (01):
  • [5] Emission in the extreme ultraviolet by xenon excited in a capillary discharge
    Boboc, T
    Bischoff, R
    Langhoff, H
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (16) : 2512 - 2517
  • [6] Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser
    Wild, Jan
    Pira, Peter
    Burian, Tomas
    Vysin, Ludek
    Juha, Libor
    Zelinger, Zdenek
    Danis, Stanislav
    Nehasil, Vaclav
    Rafaj, Zdenek
    Nevrly, Vaclav
    Dostal, Michal
    Bitala, Petr
    Kudrna, Pavel
    Tichy, Milan
    Rocca, Jorge J.
    NUKLEONIKA, 2020, 65 (04) : 205 - 210
  • [7] LASER-LIGHT IN THE EXTREME ULTRAVIOLET
    ROBINSON, AL
    SCIENCE, 1983, 220 (4603) : 1259 - 1261
  • [8] Dynamic Characteristics of Laser-Assisted Discharge Plasmas for Extreme Ultraviolet Light Sources
    Lu, Peng
    Katsuki, Sunao
    Tomimaru, Nobufumi
    Ueno, Takahisa
    Akiyama, Hidenori
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (09)
  • [9] Titanium plasma source for capillary discharge extreme ultraviolet lasers
    Shuker, M
    Ben-kish, A
    Fisher, A
    Ron, A
    APPLIED PHYSICS LETTERS, 2006, 88 (06)
  • [10] Laser-produced plasma light source for extreme-ultraviolet lithography applications
    Abhari, Reza S.
    Rollinger, Bob
    Giovannini, Andrea Z.
    Morris, Oran
    Henderson, Ian
    Ellwi, Samir S.
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
12345