I-V Hysteresis in ESD Protection SCR Due to Jumping Between Bulk and Surface Current Paths

被引:0
|
作者
Krainer, Rudolf [1 ]
Jomar, Hossam [1 ]
Rockermeier, Hubert [1 ]
Holland, Steffen [2 ]
Ritter, Hans-Martin [2 ]
Kumar, Vasantha [2 ]
Pogany, Dionyz [1 ]
机构
[1] TU Wien TU Vienna, Inst Solid State Elect, A-1040 Vienna, Austria
[2] Nexperia Germany GmbH, D-22529 Hamburg, Germany
关键词
Hysteresis; Fingers; Transistors; Impact ionization; Electrostatic discharge protection; Voltage measurement; Substrates; Charge carrier processes; Rectifiers; Microscopy; Electrostatic discharge (ESD) protection; emission microscopy (EMMI); I-V hysteresis; sharp snapback; silicon-controlled rectifier (SCR); technology computer-aided design (TCAD); DEVICES; DESIGN;
D O I
10.1109/TED.2024.3488682
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The origin of an I-V hysteresis and sharp snapback of single finger silicon-controlled rectifiers (SCRs) for system-level electrostatic discharge (ESD) protection is investigated experimentally and by 2-D technology computer-aided design (TCAD) simulation. Emission microscopy (EMMI) measurements indicate spatial changes in current flow, which is reproduced in simulations using up and down current sweeps. A bulk current path, via two serially connected n-p-n transistors, comprising buried layers (BLs) gives rise to a high-voltage I-V (HV-IV) branch. The sharp snapback is caused by a sudden jump of the current path from the bulk to surface region, thus activating the SCR. The TCAD reveals that charge conditions at the surface determine the stability of the bulk path, and thus the existence of the hysteresis, via the location of impact ionization generation source. The results are important for understanding the complex interplay and coupling of parallel current paths in SCRs.
引用
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页数:6
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