3-D TCAD Methodology for Simulating Double-Hysteresis Filamentary I-V Behavior and Holding Current in ESD Protection SCRs

被引:3
|
作者
Karaca, Hasan [1 ]
Holland, Steffen [2 ]
Ritter, Hans-Martin [2 ]
Kumar, Vasantha [2 ]
Notermans, Guido [2 ]
Pogany, Dionyz [1 ]
机构
[1] Vienna Univ Technol TU Wien, Inst Solid State Elect FKE, A-1040 Vienna, Austria
[2] Nexperia Germany GmbH, D-22529 Hamburg, Germany
关键词
3-D technology computer-aided design (TCAD) simulation; current filamentation; double-hysteresis I-V; electrostatic discharge (ESD) protection; emission microscopy (EMMI); holding current; latch-up immunity; silicon controlled rectifier (SCR); SCR triggering; IMMUNE; DESIGN;
D O I
10.1109/TED.2021.3100301
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Current filament (CF)-related double-hysteresis I-V behavior and holding current, I HOLD, are analyzed using experiments and 3-D technology computer-aided design (TCAD) simulation in silicon-controlled rectifiers (SCR) for system-level electrostatic discharge (ESD) protection. Our 3-D TCAD methodology uses up and down quasi-dc current sweeps to reveal a memory effect in the current density distribution along the device width. I-HOLD is related to the smallest possible CF where the self-sustaining SCR action takes place during down current sweep. I-HOLD exhibits a nontrivial dependence on device width, depending on whether a CF is created or not. Analyzing devices of different layouts shows that I HOLD values determined from experiments and 3-D TCAD are almost layout-independent and substantially lower than those evaluated from2-D TCAD. I-HOLD calculated by 3-D TCAD in edge-terminated devices is higher than that in 3-D structures obtained from simple width-extended 2-D doping profiles. The use of latter devices, thus, simplifies the 3-D TCAD I-V analysis and provides a safe margin for I-HOLD prediction. The work is relevant for designing the latch-up immunity of ESD protection devices, and it also shows that conventional 2-D TCAD can provide unwanted overestimation of I-HOLD.
引用
收藏
页码:4214 / 4222
页数:9
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