共 50 条
- [23] EXPERIMENTAL AND THEORETICAL STUDIES OF ELECTRON BEAM, RESIST AND SUBSTRATE INTERACTION IN ELECTRON BEAM LITHOGRAPHY. Nuclear Instruments and Methods, 1980, : 311 - 321
- [25] Photocurable resists for imprint lithography. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2005, 229 : U1119 - U1119
- [28] ALIGNMENT SIGNALS FROM SILICON TAPERED STEPS FOR ELECTRON BEAM LITHOGRAPHY. Journal of Applied Physics, 1982, 53 (02): : 899 - 911
- [29] Tribological issues in nanoimprint lithography. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U807 - U807