POLYSILOXANES FOR DEEP UV LITHOGRAPHY.

被引：4

作者：

Shaw, J.M. ^{[1
]}

Hatzakis, M. ^{[1
]}

Parasczcak, J. ^{[1
]}

Bagbich, E. ^{[1
]}

机构：

[1] IBM, T. J. Watson Research Cent,, Yorktown Heights, NY, USA, IBM, T. J. Watson Research Cent, Yorktown Heights, NY, USA

来源：

关键词：

D O I：

10.1016/0167-9317(85)90039-5

中图分类号：

学科分类号：

摘要：

引用

页码：293 / 304

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