Self-development properties of nitrocellulose for focused ion beam lithography

被引：0
|
作者：
Kaneko, Hidehiko [1 ]
Yasuoka, Yoshizumi [1 ]
Gamo, Kenji [1 ]
Namba, Susumu [1 ]
机构：
[1] Natl Defense Acad, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 09期
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D O I：
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摘要：
7
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页码：1764 / 1767
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