Ultrahigh vacuum arcjet nitrogen source for selected energy epitaxy of group III nitrides by molecular beam epitaxy

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Grunthaner, F.J.
Bicknell-Tassius, R.
Deelman, P.
Grunthaner, P.J.
Bryson, C.
Snyder, E.
Giuliani, J.L.
Apruzese, J.P.
Kepple, P.
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films | 1998年 / 16卷 / 3 pt 2期
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