Optical emission diagnostics of permanent and pulsed microwave discharges in H2-CH4-N2 for diamond deposition

被引：0
|
作者：
Universite Henri Poincare - Nancy I, Vandoeuvre les Nancy, France [1 ]
机构：
来源：
Surf Coat Technol | / 1233-1237期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Optical emission spectroscopic studies of microwave enhanced diamond CVD using CH4/CO2 plasmas
    Elliott, MA
    May, PW
    Petherbridge, J
    Leeds, SM
    Ashfold, MNR
    Wang, WN
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 311 - 316
  • [42] Deposition of ultra-nanocrystalline diamond films using a Ar/H2/CH4 microwave discharge
    Huang, W.S.
    Asmussen, Jes
    Wright, B.
    Krauss, A.R.
    Gruen, D.M.
    Sumant, A.
    IEEE International Conference on Plasma Science, 2000,
  • [43] Production of active-species in N2-CH4 flowing microwave discharges
    Peze-Bourdarie, P
    Ricard, A
    de Souza, AR
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1999, 54 (294): : 456 - 460
  • [44] SYSTEMATIC INVESTIGATION OF PLASMA EMISSION-SPECTRA DURING MICROWAVE DIAMOND DEPOSITION FROM CH4-CO2 AND C2H2-CO2 GAS-MIXTURES
    BALESTRINO, G
    MARINELLI, M
    MILANI, E
    PAOLETTI, A
    PAROLI, P
    PINTER, I
    TEBANO, A
    DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) : 389 - 392
  • [45] Molecular dissociation in N2-H2 microwave discharges
    Tatarova, E
    Dias, FM
    Gordiets, B
    Ferreira, CM
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2005, 14 (01): : 19 - 31
  • [46] Determination of gas temperature and C2 absolute density in Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition from the C2 Mulliken system
    Lombardi, G
    Bénédic, F
    Mohasseb, F
    Hassouni, K
    Gicquel, A
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2004, 13 (03): : 375 - 386
  • [47] Removal of NO in NO/N2, NO/N2/O2, NO/CH4/N2, and NO/CH4/O2/N2 systems by flowing microwave discharges
    Hueso, Jose L.
    Gonzalez-Elipe, Agustin R.
    Cotrino, Jose
    Caballero, Alfonso
    JOURNAL OF PHYSICAL CHEMISTRY A, 2007, 111 (06): : 1057 - 1065
  • [48] Axial distribution of emission and rate of deposition of diamond-like film in rf discharges in CH4
    Petrovic, ZL
    Boskovic, B
    Jelenak, A
    Tomcik, B
    THIN SOLID FILMS, 1997, 304 (1-2) : 136 - 143
  • [49] Diamond thin film growth by pulsed microwave plasma at high power density in a CH4-H2 gas mixture
    Lamara, T
    Belmahi, M
    Bougdira, J
    Bénédic, F
    Henrion, G
    Rémy, M
    SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 784 - 789
  • [50] Spectroscopic study of H2 microwave plasmas with small admixtures of CH4 and B2H6 used for doped diamond deposition
    Hamann, S.
    Rond, C.
    Pipa, A. V.
    Wartel, M.
    Lombardi, G.
    Gicquel, A.
    Roepcke, J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2014, 23 (04):
12345