Optical emission diagnostics of permanent and pulsed microwave discharges in H2-CH4-N2 for diamond deposition

被引：0
|
作者：
Universite Henri Poincare - Nancy I, Vandoeuvre les Nancy, France [1 ]
机构：
来源：
Surf Coat Technol | / 1233-1237期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [11] Optical Emission from C2- Anions in Microwave-Activated CH4/H2 Plasmas for Chemical Vapor Deposition of Diamond
    Mahoney, E. J. D.
    Truscott, B. S.
    Ashfold, M. N. R.
    Mankelevich, Yu. A.
    JOURNAL OF PHYSICAL CHEMISTRY A, 2017, 121 (14): : 2760 - 2772
  • [12] Synthesis of nanocrystalline diamond films in Ar/H2/CH4 microwave discharges
    Bénédic, F
    Mohasseb, F
    Bruno, P
    Silva, F
    Lombardi, G
    Hassouni, K
    Gicquel, A
    Synthesis, Properties and Applications of Ultrananocrystalline Diamond, 2005, 192 : 79 - 92
  • [13] Formation of soot particles in Ar/H2/CH4 microwave discharges during nanocrystalline diamond deposition:: A modeling approach
    Hassouni, K
    Mohasseb, F
    Bénédic, F
    Lombardi, G
    Gicquel, A
    PURE AND APPLIED CHEMISTRY, 2006, 78 (06) : 1127 - 1145
  • [14] Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition
    Ma, Jie
    Ashfold, Michael N. R.
    Mankelevich, Yuri A.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (04)
  • [15] Time-resolved study of pulsed Ar-N2 and Ar-N2-H2 microwave surfaguide discharges using optical emission spectroscopy
    Britun, Nikolay
    Godfroid, Thomas
    Snyders, Rony
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (03):
  • [16] Modelling of Ar/H2/CH4 microwave discharges used for nanocrystalline diamond growth
    Mohasseb, F
    Hassouni, K
    Bénédic, F
    Lombardi, G
    Gicquel, A
    Synthesis, Properties and Applications of Ultrananocrystalline Diamond, 2005, 192 : 93 - 108
  • [17] Experimental study of plasma decay in pulsed microwave discharges of H2, CH4 and their mixtures
    Ivanov, O. A.
    Vikharev, A. L.
    Gorbachev, A. M.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (03):
  • [18] Diagnostic of a pulsed CH4-H2 plasma to improve microwave plasma assisted chemical vapour deposition process for diamond synthesis
    De Poucques, L
    Henrion, G
    Bougdira, J
    Hugon, R
    SURFACE & COATINGS TECHNOLOGY, 2001, 146 : 586 - 592
  • [19] Optical and mass spectroscopic properties of microwave CH4/H2/Ar plasma for diamond deposition in a resonance cavity
    Li, H.
    Yang, K.
    Liu, H. X.
    Zhu, X. D.
    VACUUM, 2018, 147 : 45 - 50
  • [20] Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition
    LIMHP, CNRS-UPN, Avenue J. B. Clément, 93430 Villetaneuse, France
    Plasma Chem. Plasma Process., 3 (325-362):
12345