SELF-ALIGNED CoSi2 INTERCONNECTION AND CONTACT TECHNOLOGY FOR VLSI APPLICATIONS.

被引:0
|
作者
Van den hove, Luc [1 ]
Wolters, Rob [1 ]
Maex, Karen [1 ]
De Keersmaecker, Roger F. [1 ]
Declerck, Gilbert J. [1 ]
机构
[1] Katholieke Univ Leuven, Belg, Katholieke Univ Leuven, Belg
关键词
D O I
暂无
中图分类号
学科分类号
摘要
16
引用
收藏
页码:554 / 561
相关论文
共 50 条
  • [31] MO/TIW CONTACT FOR VLSI APPLICATIONS.
    Kim, Manjin J.
    Brown, Dale M.
    Cohen, Simon S.
    Piacente, Patricia
    Gorowitz, Bernard
    IEEE Transactions on Electron Devices, 1985, ED-32 (07) : 1328 - 1333
  • [32] ALIGNED AND TWINNED ORIENTATIONS IN EPITAXIAL COSI2 LAYERS
    VANDERSTRAETEN, H
    BRUYNSERAEDE, Y
    WU, MF
    VANTOMME, A
    LANGOUCHE, G
    PHILLIPS, JM
    APPLIED PHYSICS LETTERS, 1990, 57 (02) : 135 - 137
  • [33] CHARACTERIZATION AND APPLICATION OF FINE-PATTERNED SI/COSI2/SI DOUBLE HETEROSTRUCTURES FABRICATED BY SELF-ALIGNED, 2-STEP MBE
    MIYAO, M
    NAKAGAWA, K
    NAKAMURA, N
    OHSHIMA, T
    JOURNAL OF CRYSTAL GROWTH, 1991, 111 (1-4) : 957 - 960
  • [34] Self-aligned passivation technology for copper interconnection using copper-aluminum alloy
    Awaya, N
    Kobayashi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (3B): : 1548 - 1553
  • [35] SELF-ALIGNED TRANSISTORS WITH POLYSILICON EMITTERS FOR BIPOLAR VLSI
    CUTHBERTSON, A
    ASHBURN, P
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1985, 20 (01) : 162 - 167
  • [36] SELF-ALIGNED TRANSISTORS WITH POLYSILICON EMITTERS FOR BIPOLAR VLSI
    CUTHBERTSON, A
    ASHBURN, P
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) : 242 - 247
  • [37] SELF-ALIGNED GRADED-DRAIN STRUCTURE FOR VLSI
    SATOH, S
    ABE, H
    JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS, 1984, 13 : 121 - 135
  • [38] SELF-ALIGNED TISI2 FOR BIPOLAR APPLICATIONS
    KOH, Y
    CHIEN, F
    VORA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06): : 1715 - 1724
  • [39] SELF-ALIGNED TINXOY/TISI2 CONTACT FORMATION
    KU, YH
    LEE, SK
    KWONG, DL
    THIN SOLID FILMS, 1989, 172 (01) : 1 - 14
  • [40] STABLE, SELF-ALIGNED TINXOY/TISI2 CONTACT FORMATION FOR SUBMICRON DEVICE APPLICATIONS
    KU, YH
    LOUIS, E
    SHIH, DK
    LEE, SK
    KWONG, DL
    ALVI, NS
    APPLIED PHYSICS LETTERS, 1987, 50 (22) : 1598 - 1600