PRIME process for deep UV and e-beam lithography

被引：11
|
作者：
Pierrat, C. [1 ]
Tedesco, S. [1 ]
Vinet, F. [1 ]
Mourier, T. [1 ]
Lerme, M. [1 ]
DalZotto, B. [1 ]
Guibert, J.C. [1 ]
机构：
[1] LETI, France
来源：
Microelectronic Engineering | 1990年 / 11卷 / 1-4期
关键词：
Dry Developed Resist - E-Beam Lithography - Polysilicon - PRIME (Positive Resist Image by Dry Etching - Rutherford Backscattering - Silylation;
D O I：
10.1016/0167-9317(90)90160-U
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：507 / 514
相关论文
共 50 条
  • [41] Correction Algorithm for the Proximity Effect in e-beam Lithography
    Zarate, Juan Jose
    Pastoriza, Hernan
    2008 ARGENTINE SCHOOL OF MICRO-NANOELECTRONICS, TECHNOLOGY AND APPLICATIONS, 2008, : 38 - 42
  • [42] E-BEAM EXPOSURE FOR SEMICONDUCTOR-DEVICE LITHOGRAPHY
    WEBER, EV
    MOORE, RD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (11) : 1339 - 1339
  • [43] Relativistic focus condition for e-beam projection lithography
    Kim, JI
    Wei, Y
    Park, GS
    Kim, DW
    Yoo, IK
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (12): : 8044 - 8047
  • [44] Combined e-beam lithography using different energies
    Kratky, Stanislav
    Kolarik, Vladimir
    Horacek, Miroslav
    Meluzin, Petr
    Kral, Stanislav
    MICROELECTRONIC ENGINEERING, 2017, 177 : 30 - 34
  • [45] Process latitude enhancement for 3d structure formation in e-beam lithography
    Kudryashov, VA
    Krasnov, VV
    Prewett, PD
    Hall, TJ
    MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 487 - 490
  • [46] Process latitude for 100 nm dimensions for e-beam lithography in SAL-601
    Dobisz, EA
    Marrian, CRK
    ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI, 1996, 2723 : 383 - 392
  • [47] Towards large area simulation of E-beam lithography
    Bohn, M
    Hofmann, U
    Hoppe, W
    Progler, C
    Ryzhoukhin, M
    23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2003, 5256 : 695 - 700
  • [48] Direct Patterning of Ionic Polymers with E-Beam Lithography
    Annina M. Steinbach
    Stefan Jenisch
    Parisa Bakhtiarpour
    Masoud Amirkhani
    Steffen Strehle
    MRS Advances, 2016, 1 (1) : 45 - 50
  • [49] An electronic image adjustment device for e-beam lithography
    Waskiewicz, WK
    CHARGED-PARTICLE OPTICS II, 1996, 2858 : 156 - 165
  • [50] Alignment Strategy for Mixed E-Beam and Optical Lithography
    Duval, Paul
    Tabatabaie-Alavi, Kamal
    Shaw, Dale
    St Germain, Alan
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V, 2013, 8680
12345