PRIME process for deep UV and e-beam lithography

被引：11
|
作者：
Pierrat, C. [1 ]
Tedesco, S. [1 ]
Vinet, F. [1 ]
Mourier, T. [1 ]
Lerme, M. [1 ]
DalZotto, B. [1 ]
Guibert, J.C. [1 ]
机构：
[1] LETI, France
来源：
Microelectronic Engineering | 1990年 / 11卷 / 1-4期
关键词：
Dry Developed Resist - E-Beam Lithography - Polysilicon - PRIME (Positive Resist Image by Dry Etching - Rutherford Backscattering - Silylation;
D O I：
10.1016/0167-9317(90)90160-U
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：507 / 514
相关论文
共 50 条
  • [1] Analysis of e-beam impact on the resist stack in e-beam lithography process
    Indykiewicz, K.
    Paszkiewicz, B.
    ELECTRON TECHNOLOGY CONFERENCE 2013, 2013, 8902
  • [2] 2-LAYER RESIST SYSTEMS FOR HYBRID E-BEAM DEEP-UV LITHOGRAPHY
    TAKASU, Y
    TODOKORO, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03): : 869 - 873
  • [3] An improved PBS process for the e-beam photomask lithography
    Shen, WP
    Marra, J
    VanDenBroeke, D
    16TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1996, 2884 : 48 - 66
  • [4] ADVANCED E-BEAM LITHOGRAPHY
    TAKIGAWA, T
    WADA, H
    OGAWA, Y
    YOSHIKAWA, R
    MORI, I
    ABE, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2981 - 2985
  • [5] Evaluation of chemically amplified deep UV resist for micromachining using e-beam lithography and dry etching
    Hudek, P
    Rangelow, IW
    Kostic, I
    Munzel, N
    Daraktchiev, I
    MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 309 - 312
  • [6] Improved process control of photomask fabrication in e-beam lithography
    Cha, BC
    Park, JH
    Choi, YH
    Kim, JM
    Han, WS
    Yoon, HS
    Sohn, JM
    20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 508 - 512
  • [7] Hybrid E-beam lithography and process improvement for nanodevice fabrication
    Servin, I
    Laulagnet, F.
    Cannac, M.
    Gharbi, Ahmed
    Dallery, J-A
    PHOTOMASK TECHNOLOGY 2020, 2020, 11518
  • [8] E-BEAM LITHOGRAPHY FOR DIGITAL HOLOGRAMS
    VERHEIJEN, MJ
    JOURNAL OF MODERN OPTICS, 1993, 40 (04) : 711 - 721
  • [9] Bilayer resist used in e-beam lithography for deep narrow structures
    van Delft, FCMJM
    MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) : 369 - 373
  • [10] Bilayer resist used in e-beam lithography for deep narrow structures
    Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, Netherlands
    Microelectron Eng, 1 (369-373):
12345