Particle generation and film formation in an atmospheric-pressure chemical vapor deposition reactor using the tetraethylorthosilicate (TEOS)/He, TEOS/O2/He, and TEOS/O3/He systems

被引：0

作者：

Adachi, Motoaki ^{[1
]}

Okuyama, Kikuo ^{[1
]}

Tohge, Noboru ^{[1
]}

Shimada, Manabu ^{[1
]}

Sato, Jun-ichi ^{[1
]}

Muroyama, Masakazu ^{[1
]}

机构：

[1] Univ of Osaka Prefecture, Osaka, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 5 B期

关键词：

Film formation - Gas phase nucleation - Particle generation - Silicon dioxide film - Tetraethylorthosilicate;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：748 / 751

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