Particle generation and film formation in an atmospheric-pressure chemical vapor deposition reactor using the tetraethylorthosilicate (TEOS)/He, TEOS/O2/He, and TEOS/O3/He systems

被引：0
|
作者：
Adachi, Motoaki [1 ]
Okuyama, Kikuo [1 ]
Tohge, Noboru [1 ]
Shimada, Manabu [1 ]
Sato, Jun-ichi [1 ]
Muroyama, Masakazu [1 ]
机构：
[1] Univ of Osaka Prefecture, Osaka, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 5 B期
关键词：
Film formation - Gas phase nucleation - Particle generation - Silicon dioxide film - Tetraethylorthosilicate;
D O I：
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学科分类号：
摘要：
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页码：748 / 751
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