共 50 条
- [41] Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (2B): : L168 - L170
- [45] Degradation of hydrogenated amorphous silicon passivation films caused by sputtering deposition PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2015, 212 (08): : 1817 - 1822
- [48] High-rate deposition of hydrogenated amorphous silicon films and devices Applied physics communications, 1988, 8 (04): : 239 - 298
- [49] ION-BEAM DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 305 - 306