共 50 条
- [32] Ion beam-induced chemical vapor deposition with hexamethyldisilane for hydrogenated amorphous silicon carbide and silicon carbonitride films SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 624 - 627
- [33] Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition Appl Phys Lett, 12 (1705):
- [35] CONTRIBUTIONS OF SILICON-HYDRIDE RADICALS TO HYDROGENATED AMORPHOUS-SILICON FILM FORMATION IN WINDOWLESS PHOTOCHEMICAL VAPOR-DEPOSITION SYSTEM JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (02): : 950 - 955
- [36] INITIAL STEPS IN THE PHOTOCHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (02): : 93 - 102
- [38] PHOTOCHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE FILMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 363 - 368
- [39] DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS USING A MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION METHOD WITH DC BIAS JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (06): : 1245 - 1247