In situ study of the interfaces between plasma-deposited amorphous silicon and silicon dioxide by UV-IR spectroellipsometry

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作者：
Shirai, Hajime [1 ]
Ossikovski, Razvigor [1 ]
Drevillon, Bernard [1 ]
机构：
[1] CNRS, Palaiseau, France
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| 1600年 / JJAP, Minato-ku, Japan卷 / 33期
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