Investigation of scanning electron microscope overlay metrology

被引：0
|
作者：
Koike, Toru [2 ]
Ikeda, Takahiro [2 ]
Abe, Hideaki [1 ,2 ]
Komatsu, Fumio [1 ,2 ]
机构：
[1] Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
[2] ULSI Process Engineering Laboratory, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 12 B期
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页码：7159 / 7163
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