Optimum phase condition for low-contrast X-ray masks

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作者
Fujii, Kiyoshi [1 ]
Suzuki, Katsumi [1 ]
Matsui, Yasuji [1 ]
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[1] Super-fine SR Lithography Laboratory, Assoc. Super-Adv. Electronics T., 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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6
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页码:7076 / 7079
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